Repeated 3D Nucleation in Electroless Cu Deposition and the Grain Boundary Structure Involved

HH Hsu,JW Yeh,SJ Lin
DOI: https://doi.org/10.1149/1.1618227
IF: 3.9
2003-01-01
Journal of The Electrochemical Society
Abstract:Agglomerations composed of Cu nanocrystallites are observed in the electroless Cu films deposited on Pd-activated TaN/SiO2/Si substrates. They were found to in situ recrystallize as large grains when exposed to the electron-beam of scanning electron microscopy (SEM). This observation not only confirms the self-induced repeated nucleation involved in electroless crystallization, but indicates that low-angle grain boundaries form during repeated nucleation of Cu nuclei in the Cu film. The rotation of Cu nanocrystallites by slipping away the boundary dislocations in low-angle boundaries is responsible for the recrystallization induced by the electron-beam under SEM observation. (C) 2003 The Electrochemical Society. All rights reserved.
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