Complete Band Alignment Determination of Inas-Gasb Broken-Gap Tunneling Field-Effect Transistor Hetero-Junction

W. Li,Q. Zhang,O. A. Kirillov,R. Bijesh,Y. Liang,D. Mohata,B. Tian,X. Liang,S. Datta,C. A. Richter,D. J. Gundlach,N. V. Nguyen
DOI: https://doi.org/10.1109/drc.2013.6633885
2013-01-01
Abstract:The Tunneling Field-Effect Transistor (TFET) is currently considered to be a promising candidate for future low power electronic device applications because of its potential to achieve less than 60mV/decade subthreshold slope. Broken-gap hetero-junction TFETs are particularly attractive because they have been shown to have improved on-state performance compared to other TFET architectures due to the lower tunnel barrier heights.[1] Accurate band alignment determination is therefore critical to the design of proper band offsets at the hetero-junction interface. Here, we report the first complete band alignment determination for these structures by tailoring the layer thickness of the junction [2] and then using of graphene as transparent electrodes in an internal photo emission (IPE) me asurement to probe both electron and hole emission[3].
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