Properties Study of ZnS Thin Films Fabricated at Different Substrate Temperatures by Pulsed Laser Deposition

Zhenxun Ming,Chao Ding,Bing Li,Jingquan Zhang,Wei Li,Lili Wu,Lianghuan Feng,Judy Feng

DOI: https://doi.org/10.4028/www.scientific.net/amr.821-822.835

2013-01-01

Advanced Materials Research

Abstract:This paper focuses on physical properties of ZnS thin films.ZnS thin films were successfully fabricated on Fluorine-Tin-Oxide(FTO) substrates(in a vacuum chamber maintained at 10-6Torr) at the substrate temperatures(Ts) of 150°Cand 200°Cby pulsed laser deposition(PLD),respectively.The structural properties of the ZnS films were analyzed with a X-ray diffraction(XRD) spectroscopy;The surface morphology of ZnS films was examined using scanning electron microscopy(SEM). With the increasing of the substrate temperature,the intensity of the (111) diffraction peak increases clearly and the surface of the ZnS films was more homogeneous and more compact.The main phase of the films deposited at 150°C and 200°C are both cubic-zinc-blende structure.The transmission spectra of the films was measured by UV-Vis spectrophotometer(UV,model a Perkin Elmer-Lambda 950),it shown that the films have the high transmittance in the spectrum of the visible light range,and the optical energy gaps were 3.48eV and 3.54eV,corresponding to the substrate temperatures of 150°C and 200°C.The results shown that the PLD technique can fabricate the better ZnS thin films.