Fabrication of Ultra-High-q Ta2O5 Microdisks by Photolithography-Assisted Chemo-Mechanical Etching
Minghui Li,Guanghui Zhao,Jintian Lin,Renhong Gao,Jianglin Guan,CHuntao Li,Qian Qiao,Yingnuo Qiu,Li Deng,Lingling Qiao,Min Wang,Ya Cheng
DOI: https://doi.org/10.1364/oe.529379
IF: 3.8
2024-01-01
Optics Express
Abstract:Tantalum pentoxide (Ta2O5) is widely recognized as a promising material platform for photonic integration. This is primarily attributed to its exceptional properties including large bandgap of 3.8 eV, broad transparency window ranging from 300 nm to 8000 nm, high nonlinear refractive index of similar to 7.2 x 10-19 m2/W, low optical loss, moderate refractive index of 2.05, low intrinsic material stress, compatibility with CMOS technology, and high solubility for rare-earth ions. However, dry etching of Ta2O5 is challenging and typically results in sidewall roughness with substantial scattering losses. Here, we report on fabrication of a high-Q whispering gallery mode (WGM) microdisk with a diameter of 120 mu m and a loaded Q factor of 1.92 x 106 by femtosecond laser photolithography assisted chemo-mechanical etching (PLACE) on amorphous Ta2O5 film. Thanks to the suppression of sidewall scattering, the loaded Q factor is two orders of magnitude higher than the best reported value in dispersion engineered Ta2O5 microresonators.