Abstract:In this investigation, a novel heat-sensitive material titanium oxide (TiOx) thin film was deposited on well cleaned K9 glass substrates by d.c. reactive magnetron sputtering from a metallic titanium target in an Ar + O2 gas mixture. In order to obtain proper TiOx thin films, deposition parameters should be properly controlled. In our system, TiOx thin films were obtained at different substrate temperature while total pressure and oxygen partial pressure were kept at 1 Pa and 0.6 Pa, d.c. power of 100 W, and the deposition time was adjusted in order to deposit thin films with a constant thickness close to 200 nm. The crystalline structure was characterized by X-ray diffraction (XRD) analysis and the results show that all the deposited films have an amorphous structure. In this paper, we have mainly investigated the dependence of electrical and optical properties of the reactively sputtered TiOx thin films on the different substrate temperature during the sputtering process, i.e., as the K9 glass substrate temperature increases from 100 °C to 250°C, the sheet resistance Rs of TiOx thin films is ranged from 305 kΩ/square to 36 kΩ/square, temperature coefficient of resistance (TCR) value up to -2.12 %/K is obtained, optical band gap decreases from 3.34 eV to 3.28 eV. Through the analysis and discussion of the above experimental data, we could obtain the conclusion that the variation in substrate temperature during the sputtering deposition plays a considerable important role in the electrical and optical properties of all the deposited films.

Electrical and Optical Properties of Reactive Sputtered TiO X Thin Films for Uncooled IR Detector Applications

Low Temperature Fabrication of Nanostructured Titanium Oxide Thin Films for Uncooled Ir Detectors

Heat sensitive property of sputtered titanium oxide thin films for uncooled IR detector application

Annealing Temperature Dependent Microstructure and Optical Properties of HfxTi1-xO2 Thin Films

APPLICATION AND OPTICAL PROPERTIES OF TiO_2 THINFILMS PREPARED BY CHEMICAL VAPOUR DEPOSITION

Investigations on titanium oxide film as an alternative heat sensitive material

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Systematical Investigations of Annealing Effects on Electrical Properties and Thermal Sensitivity Characteristics of TiO 2-Δ Thin Films by DC Reactive Magnetron Sputtering

Photoelectrochemical Characteristics of Nano-Titanium Dioxide Thin Films Prepared by RF Magnetron Sputtering

Synthesis, Phase Transition and Optical Properties of Nanocrystalline Titanium Dioxide Films Deposited by Plasma Assisted Reactive Pulsed Laser Deposition

The Influence of Substrate Temperature on the Electrical and Optical Properties of Titanium Oxide Thin Films Prepared by D.c. Reactive Magnetron Sputtering

Study of optical and electrical properties of TiN thin films prepared by cathodic ion sputtering

Investigations of Electronic Properties of TiO_x Thin Films by DC Reactive Magnetron Sputtering

Photoelectron Properties of Nanocrystalline Tio2 Films Prepared by A Powerful Hydrothermal Technique

STRUCTURE AND OPTICAL PROPERTIES OF HIGH-RATE LOW-TEMPERATURE GROWN TiO2 THIN FILMS BY REACTIVE MAGNETRON SPUTTERING

Preparation of TiO2-x film with a high TCR performance for uncooled thermal sensor

Study on infrared absorption characteristics of Ti and TiNx nanofilms

Investigations of Optoelectronic Properties of TiO_x Thin Films on Different Depositing Temperatures by DC Reactive Magnetron Sputtering

Optical Constants and Band Gap Evolution with Phase Transition in Sub-20-nm-Thick TiO2 Films Prepared by ALD

Influence of Thermal Annealing on Structural and Optical Properties of RF-sputtered LiTaO3 Thin Films

Temperature-dependent optical properties of titanium oxide thin films studied by spectroscopic ellipsometry