Low Temperature Fabrication of Nanostructured Titanium Oxide Thin Films for Uncooled Ir Detectors

Yongfeng Ju,Zhiming Wu,Shibin Li,Xiang Dong,Yadong Jiang
DOI: https://doi.org/10.1166/jno.2012.1308
2012-01-01
Journal of Nanoelectronics and Optoelectronics
Abstract:Nanostructured titanium oxide (ns-TiOx) thin films have been deposited on the glass substrates by direct current reactive magnetron sputtering in a controlled Ar/O-2 atmosphere. The glancing incidence X-ray diffraction results indicate that the films grown at room temperature and 200 degrees C show amorphous and nanocrystalline rutile phase, respectively. The surface morphological images characterized by field emission scanning microscopy show that plenty of rutile nanocrystals are embedded in the cluster-assembled ns-TiOx thin films. The redshifts of Raman frequencies for the rutile fundamental Raman-active modes and asymmetric peak broadening feature illustrate that the crystal size effect and defect structure play key roles in physical property of the films. The results of optical and electrical measurements elucidate that the absorption edge of ns-TiOx has a redshift due to the crystallization, and the ns-TiOx has a high temperature coefficient of resistance (TCR) of about -2.1%/K as well as suitable resistivity of 1.5 Omega-cm, indicating that ns-TiOx thin film is promising heat sensitive material in uncooled IR detector application.
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