Black Silicon with Controllable Macropore Array for Enhanced Photoelectrochemical Performance

Xianyu Ao,Xili Tong,Dong Sik Kim,Lianbing Zhang,Mato Knez,Frank Mueller,Sailing He,Volker Schmidt
DOI: https://doi.org/10.1063/1.4752231
IF: 4
2012-01-01
Applied Physics Letters
Abstract:Macroporous silicon with multiscale texture for reflection suppression and light trapping was achieved through a controllable electrochemical etching process. It was coated with TiO2 by atomic layer deposition, and used as the photoanode in photocatalytic water splitting. A conformal pn-junction was also built-in in order to split water without external bias. A 45% enhancement in photocurrent density was observed after black silicon etching. In comparison with nano-structured silicon, the etching process here has neither metal contamination nor requirement of vacuum facilities.
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