Temperature Dependence Of The Thickness And Morphology Of Epitaxial Graphene Grown On Sic (0001) Wafers

Hao Xin,Chen Yuan-Fu,Li Ping-Jian,Wang Ze-Gao,Liu Jing-Bo,He Jia-Rui,Fan Rui,Sun Ji-Rong,Zhang Wan-Li,Li Yan-Rong
DOI: https://doi.org/10.1088/1674-1056/21/4/046801
2012-01-01
Abstract:Epitaxial graphene is synthesized by silicon sublimation from the Si-terminated 6H-SiC substrate. The effects of graphitization temperature on the thickness and surface morphology of epitaxial graphene are investigated. X-ray photoelectron spectroscopy spectra and atomic force microscopy images reveal that the epitaxial graphene thickness increases and the epitaxial graphene roughness decreases with the increase in graphitization temperature. This means that the thickness and roughness of epitaxial graphene films can be modulated by varying the graphitization temperature. In addition, the electrical properties of epitaxial graphene film are also investigated by Hall effect measurement.
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