Abstract:The atomic force microscope (AFM) can be used in dynamic tipping mode as an effective lithography technique capable of manufacturing nanometer sized devices on the surface of a silicon wafer with a higher resolution surface characterization. The most difficult challenge in fabrication of nanostructure based on AFM nano-oxidation approach is the way of controlling an electric field between a cantilever probe tip and a silicon wafer. A water bridge builds up between the tip and the wafer, resulting in the oxidation due to the high electric field in the region. A reconstructive AFM system for nano-oxidation with a tapping model, implemented in an air, was developed. The presented AFM implements the increasing of electric field intensity by analyzing the impact voltage from −1 V to −5 V, electric field, and ion concentrations at the ambient/oxide and oxide/silicon interfaces, while the growth of thin oxides assumes a single liquid/silicon interface, which is modeled as an infinitely long conducting plane. Therefore, particle distribution for the surface charge density is generated for topography simulations. Based on the control-parameters, an enhanced electrical field of up to 1010 V/m can be obtained, which provides a powerful support for controllable experimental study of nanostructures fabrication with AFM tip induced local anodic oxidation. This showed the dependence of applied voltage types and various nanostructures and life time of AFM tip, by controlling tip-sample position in nanolithography processes is an important factor for controlling the aspect electric field distribution. And the effect of different parameters on enhancement distribution was performed and analyzed in this paper.

Effect of the tip-sample contact force on the nanostructure size fabricated by local oxidation nanolithography.

3-D finite element calculation of electric field enhancement for nanostructures fabrication mechanism on silicon surface with AFM tip induced local anodic oxidation

Impact of Various Parameters on Nanostructures Fabrication Mechanism on Silicon Surface with AFM Tip Induced Local Anodic Oxidation

Study on Nanofabrication with Dynamic Electrical-Field-induced Anodic Oxidation

Nanolithography by non-contact AFM induced local oxidation : Fabrication of tunneling barriers suitable for single electron devices

Preparation of Micro/Nanostructures by AFM Field-induced Oxidation

Characteristics of Local Anodic Oxidation of Silicon Surfaces by AFM and Fabrication of Nanoscale Metrology Standard Sample

Nano-Scale Sample-Plate Fabrication By Afm-Tip Induced Local Oxidation

Local Oxidation of Titanium Thin Films Using an Atomic Force Microscope under Static and Pulsed Voltages

Mechanical Writing of N-Type Conductive Layers on the SrTiO3 Surface in Nanoscale

Fabrication of regular nanostructures on the surface of Si by AFM anodic oxidation

Writing and Low-Temperature Characterization of Oxide Nanostructures

Fabrication of Nanostructures on the Surface of Titanium Film Using SPM Nanolithograpy Technique

AFM Tip-Based Fabrication of Silicon Nanostructures with Reduced Subsurface Amorphous Layers

Role of Electric Field Distribution in Local Anodic Oxidation

Nano-fabrication System Based on Atomic Force Microscopy

Local Anodic Oxidation of Superconducting NbN Thin Films by an Atomic Force Microscope

AFM local oxidation nanolithography of graphene

Nanoscale Semiconductor Processes Using STM and AFM Lithographies. Fabrication of Nanometer-to-atomic-scale Structures Using STM and AFM.

Nanodot Deposition and Its Application with Atomic Force Microscope

Experimental Study and Theoretical Analysis of the Nanometre-Scale Line Structure Fabrication by AFM Electric Lithography