Characterization of InAs/GaSb Superlattices Grown by MOCVD with Atomic Resolution
Xin Li,Jie Cui,Yu Zhao,Qihua Wu,Yan Teng,Xiujun Hao,Ying Chen,Jiafeng Liu,He Zhu,Yong Huang,Yuan Yao
DOI: https://doi.org/10.1063/1.5115269
IF: 2.877
2020-01-01
Journal of Applied Physics
Abstract:High-angle annular dark-field (HAADF) imaging and electron energy loss spectroscopy (EELS) in a Cs-corrected scanning transmission electron microscope were utilized to analyze the interfacial atomic structure of InAs/GaSb superlattices (SLs) grown by metalorganic chemical vapor deposition (MOCVD) on InAs substrates. Despite high growth temperature, narrow interface (IF) widths of less than 2.5 monolayers (MLs) and 3.8 MLs were extracted from HAADF and EELS, respectively, indicating that the IF quality of MOCVD-grown InAs/GaSb SLs is comparable to those grown by molecular beam epitaxy. GaAs-type IFs are considered to account for the narrow IF width. In addition, GaSb-on-InAs IFs were found to be sharper and more strained than InAs-on-GaSb IFs, which is correlated with the special gas supply and switching sequence during MOCVD growth. The strain profile deduced from the HAADF image suggests that little Sb is incorporated into InAs sublayers and 7% In is incorporated into GaSb sublayers.