Phase Change and Optical Band Gap Behavior of Ge–Te–Ga Thin Films Prepared by Thermal Evaporation

Guoxiang Wang,Qiuhua Nie,Xiang Shen,Fen Chen,Jun Li,Wei Zhang,Tiefeng Xu,Shixun Dai
DOI: https://doi.org/10.1016/j.vacuum.2012.03.036
IF: 4
2012-01-01
Vacuum
Abstract:The amorphous Ge11.4Te86.4Ga2.2 chalcogenide thin films were prepared by thermal evaporation onto chemically cleaned glass substrates. Properties measurements include X-ray diffraction (XRD), Scanning electron microscopy (SEM), Differential scanning calorimetry (DSC). Four-point probe and VIS-NIR transmission spectra. The allowed indirect transition optical band gap and activation energy of samples were calculated according to the classical Tauc equation and Kissinger's equation, respectively. The results show that there is an amorphous-to-crystalline phase transition of Ge11.4Te86.4Ga2.2 thin film. The investigated film has high crystallization temperature (similar to 200 degrees C) and activation energy (2.48 eV), indicating the film has good amorphous stability. The sheet resistance of the crystalline state is similar to 10 Omega/ and the amorphous/crystalline resistance ratio is about 10(5). Besides, a wide optical band gap (0.653 eV) of Ge11.4Te86.4Ga2.2 is obtained, indicating that the material possesses a low threshold current from amorphous-to-crystalline state for phase-change memory application. (C) 2012 Elsevier Ltd. All rights reserved.
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