Characterization of Zr–Si–N Films Deposited by Cathodic Vacuum Arc with Different N2/SiH4 Flow Rates

G. P. Zhang,E. W. Niu,X. Q. Wang,G. H. Lv,L. Zhou,H. Pang,J. Huang,W. Chen,S. Z. Yang

DOI: https://doi.org/10.1016/j.apsusc.2011.12.003

IF: 6.7

2011-01-01

Applied Surface Science

Abstract:Zr–Si–N films were deposited on silicon and steel substrates by cathodic vacuum arc with different N2/SiH4 flow rates. The N2/SiH4 flow rates were adjusted at the range from 0 to 12sccm. The films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscope (SEM), hardness and wear tests. The structure and the mechanical properties of Zr–Si–N films were compared to those of ZrN films. The results of XRD and XPS showed that Zr–Si–N films consisted of ZrN crystallites and SiNx amorphous phase. With increasing N2/SiH4 flow rates, the orientation of Zr–Si–N films became to a mixture of (111) and (200). The column width became smaller, and then appeared to vanish with the increase in N2/SiH4 flow rates. The hardness and Young's modulus of Zr–Si–N films increased with the N2/SiH4 flow rates, reached a maximum value of 36GPa and 320GPa at 9sccm, and then decreased 32GPa and 305GPa at 12sccm, respectively. A low and stable of friction coefficient was obtained for the Zr–Si–N films. Friction coefficient was about 0.1.