Subwavelength Patterning Based On A Surface Plasmon Resonant Cavity

Genhua Chen,Chinhua Wang,Wei Xiao,Fuyang Xu,Yiming Lou,Bing Cao,Guiju Zhang

DOI: https://doi.org/10.1117/12.975807

2012-01-01

Abstract:With the development of Super Large Scale Integration (SLSI) and integrated optics, high-resolution photolithography has become more and more important. Traditional photolithography is limited by the optical diffraction of the system. Recent discovery of extraordinary behaviors of the surface plasmon polaritons suggests a novel method of photolithography beyond the diffraction limit. In this paper, we report on a novel subwavelength nanolithography technique using a surface plasmonic resonant cavity formed by two metallic layers separated by a photoresist layer with two incident beams illuminating from two sides. Finite-difference time-domain (FDTD) simulations show that a two-dimensional (2D) dot array pattern with a period of 70 nm can be obtained using an exposure radiation of 436nm wavelength. It is also found that the period of the 2D dot array is tunable which can be implemented by varying the cavity length.