Abstract:<p>Flexible manipulation of surface plasmon polaritons (SPPs) in a small target area is very important for building functional plasmonic nanostructures. Here, we propose a second-order interference model to describe the interaction of SPPs generated between two nanoslits of a metal film, and propose a first-order interference model to describe the interaction of SPPs generated on each side of the two nanoslits. Using these models, a functional two-nanoslit unit structure that is capable of enhancing the peak intensities of SPPs between its two slits and diminishing the total intensity of SPPs on each side of its two slits can be designed, and another functional two-nanoslit unit structure that is capable of diminishing the peak intensities of SPPs between its two slits and enhancing the total intensity of SPPs on each side of its two slits can be designed too. In addition, the proposed models predicts that it is possible to design the mask that is capable of producing a complex pattern composed of multiple desired nanopatterns by combining multiple designed functional two-nanoslit unit structures together. Moreover, we numerically demonstrated that at the illumination wavelength of 405 nm, some complex patterns with a half-pitch resolution of about 56 nm, such as a superperiodic pattern and some letter-shaped patterns, can be produced in the photoresist by the masks designed using the proposed models.</p>

Large-area surface-plasmon polariton interference lithography.

248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

Polarization-interferometry-based Wavelength-Interrogation Surface Plasmon Resonance Imager for Analysis of Microarrays

Squeezing Bulk Plasmon Polaritons through Hyperbolic Metamaterials for Large Area Deep Subwavelength Interference Lithography

Two-Surface-Plasmon-Polariton-Absorption Based Nanolithography

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Two-Surface-Plasmon-Polariton-Absorption Based Lithography Using 400 Nm Femtosecond Laser

Surface-plasmon-assisted nanoscale photolithography by polarized light

Plasmonic Interference Lithography Based on the Second-Order Diffracted Wave of Grating and Hyperbolic Multilayer Graphene

Controlling the interactions of surface plasmon polaritons generated by two-nanoslit structures for producing diverse sub-diffraction-limited patterns

Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

Subwavelength Nanolithography Based on Unidirectional Excitation of Surface Plasmons

High-speed Near-Field Photolithography at 1685 Nm Linewidth with Linearly Polarized Illumination

Design of hybrid structure for fast and deep surface plasmon polariton modulation.

Interference of Surface Plasmon Polaritons Controlled by the Phase of Incident Light

Ultra-broadband and Efficient Surface Plasmon Polariton Launching Through Metallic Nanoslits of Subwavelength Period.

Experimental Demonstration Of Tunable Directional Excitation Of Surface Plasmon Polaritons With A Subwavelength Metallic Double Slit

Self-Aligned Plasmonic Lithography for Maskless Fabrication of Large-Area Long-Range Ordered 2D Nanostructures

2D Surface Optical Lattice Formed by Plasmon Polaritons with Application to Nanometer-Scale Molecular Deposition

Nano-patterning based on two-surface-plasmon-polariton-absorption using 400nm femtosecond laser