Parameters Evaluation for SiC-JFET Modeling Considering Non-Uniformity by Fabrication

Chaofeng Cai,Yilong Qu,Qing Guo,Wang Tao,Kuang Sheng
DOI: https://doi.org/10.1109/isie.2012.6237126
2012-01-01
Abstract:A method for evaluating the actual parameters of SiC-JFETs with good accuracy is presented. For precise SiC-JFETs modeling, accurate parameters have to be evaluated. During the simulation study, a significant discrepancy is observed between the simulation and measurement transfer characteristics, especially at gate biases close to its threshold value. In order to account for such discrepancy, probability distribution on device channel width across the whole device is modeled and incorporated into the Shockley model. The impact caused by nonuniformity of fabrication is computed and analyzed. Values of evaluated parameters are implemented into Saber, and great accuracy is verified by experimental transfer and forward on-state measurement.
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