Abstract:Mask Projection micro-Stereolithography (MPμSL) is an additive manufacturing technique capable of producing solid parts with micron-scale resolution from a vat of photocurable liquid polymer resin. Although the physical mechanism remains the same, the process differs from traditional laser-galvanometer based stereolithography (SL) in its use of a dynamic mask UV projector, or digital light processor (DLP), which cures each location within each 3D layer at the same time. One area where MPµSL has garnered considerable attention is in the field of microfluidics and Lab-on-a-Chip, where complex multistep microfabrication techniques adopted from the semiconductor industry are still widely used, and where MPµSL offers the ability to fabricate completely encapsulated fluidic channels in a single step and at low cost [1–3]. However, a significant obstacle exists in the prevention of channel blockage due to overcuring of the polymer resin [4, 5]. Overcuring can be attributed to the so-called ‘back side effect’ [2] which occurs during the build process as light from successive layers penetrates into the resin to a depth greater than the layer thickness. This effect is most prevalent in channels or features oriented horizontally (in a parallel plane to that of the build platform). Currently there are two main approaches in controlling the cure depth; 1. the chemical approach, which involves doping the resin material with a chemical light absorber [6–8]; and 2. by improving the system's hardware and optical elements to improve the homogeneity of the light dosage and control the cure depth [9]. Here we investigate a third approach through modification of the 3D CAD file prior to printing to mitigate for UV light leakage from successive build layers. Although used here in conjunction with the MPμSL technique, this approach can be applied to a range of SL techniques to improve printer resolution and enable production of internal features with higher dimensional accuracy.

Research on the curing performance of UV-LED light based stereolithography

Energy-conserving Stereolithography System with UV-LED Light Source

Research on the Accuracy of a UV-LED Light Based Stereolithography System

An inexpensive stereolithography technology with high power UV‐LED light

Research on the Resolution of Micro Stereo Lithography

Using Variable Beam Spot Scanning to Improve the Efficiency of Stereolithography Process

The Influence of Ingredients of Silica Suspensions and Laser Exposure on UV Curing Behavior of Aqueous Ceramic Suspensions in Stereolithography

Development of a High–resolution Rapid Prototyping System for Small Size Objects

A novel stereolithography technology with conventional UV light

Study on Simulation and Experiment of Foundational Solidification Process for Stereo Photo Lithography

Research on Resin Curing Process in Ultraviolet Rapid Prototyping

Stereolithography Process Based on Double Exposal Method

Mitigation and control of the overcuring effect in mask projection micro-stereolithography

Method for Obtaining Light Curing Printing Condition Based on New Theoretical Description

Novel Stereolithography System for Small Size Objects

Preparation and Study of Stereolithography Photosensitive Resin Based on 405 Nm Uv Light Source

Optimization of Solidification Process Parameters in Micro Stereo Lithography

Printing Depth Modeling, Printing Process Quantification and Quick-Decision of Printing Parameters in Micro-Vat Polymerization

Development of a Multi-Step Exposure Method for Projection-Based Printing System

The effect of post-ultraviolet light curing on the accuracy of direct-printed aligners: an in vitro study

Research on the Accuracy of Mask Projection Stereo-Lithography