Preparation and Study of Stereolithography Photosensitive Resin Based on 405 Nm Uv Light Source

De-Chao Dong,Bin Shan,Yun-Jian Qiu,Chang-Chun Shi,Yu-Le Gao,Rong Chen
DOI: https://doi.org/10.1142/9789814759687_0058
2016-01-01
Abstract:In this paper, we use 6 different prepolymers to prepare Stereolithography photosensitive resin. Through making comparison of the resins' hardness, tensile strength and bending strength, we select resin formula which is in line with the UV curing hardness requirements. This formula has excellent integrated mechanical performance and can print models well. This resin has been put into production and has excellent commercial value.
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