Simulation of UV curing of photosensitive resins with phase change materials

Meiyin Liu,Chen Wang,Wei Guo,Chuanping Liu
DOI: https://doi.org/10.1016/j.est.2024.113373
IF: 9.4
2024-08-23
Journal of Energy Storage
Abstract:Based on the mechanism of the resin polymerization reaction and free radical diffusion under UV irradiation, here, a mathematical model of the curing process was established for the mixture of photosensitive resin (PAA) and polyethylene glycol (PEG, as the phase change material), and the factor influencing the mechanical performance of the cured samples was analyzed. The yield stress (σ s ) of the pure resin sample can reach 50 MPa when the monolayer curing depth is 5 mm. σ s decreases with the increase in the PEG content and monolayer curing depth. With increasing the monolayer exposure time, the yield stress increases and then decreases, and there is an optimum value. The material has the maximum stress at the monolayer exposure time of 13.5 s when the resin content is 50 %.
energy & fuels
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