Abstract:Mask Projection micro-Stereolithography (MPμSL) is an additive manufacturing technique capable of producing solid parts with micron-scale resolution from a vat of photocurable liquid polymer resin. Although the physical mechanism remains the same, the process differs from traditional laser-galvanometer based stereolithography (SL) in its use of a dynamic mask UV projector, or digital light processor (DLP), which cures each location within each 3D layer at the same time. One area where MPµSL has garnered considerable attention is in the field of microfluidics and Lab-on-a-Chip, where complex multistep microfabrication techniques adopted from the semiconductor industry are still widely used, and where MPµSL offers the ability to fabricate completely encapsulated fluidic channels in a single step and at low cost [1–3]. However, a significant obstacle exists in the prevention of channel blockage due to overcuring of the polymer resin [4, 5]. Overcuring can be attributed to the so-called ‘back side effect’ [2] which occurs during the build process as light from successive layers penetrates into the resin to a depth greater than the layer thickness. This effect is most prevalent in channels or features oriented horizontally (in a parallel plane to that of the build platform). Currently there are two main approaches in controlling the cure depth; 1. the chemical approach, which involves doping the resin material with a chemical light absorber [6–8]; and 2. by improving the system's hardware and optical elements to improve the homogeneity of the light dosage and control the cure depth [9]. Here we investigate a third approach through modification of the 3D CAD file prior to printing to mitigate for UV light leakage from successive build layers. Although used here in conjunction with the MPμSL technique, this approach can be applied to a range of SL techniques to improve printer resolution and enable production of internal features with higher dimensional accuracy.

Research on the Resolution of Micro Stereo Lithography

Subdiffraction 3D Nanolithography by Two‐Photon Two‐Step Absorption and Photoinhibition

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Simulation and Experimental Investigation of Immersion Flow Field in Immersion Lithography

High Throughput Laser Nano Direct Writing Technique

Beyond 100 nm Resolution in 3D Laser Lithography: Post Processing Solutions

Research on the optical field distribution and micro-fabrication model in convex-surface laser lithography

Three Dimension Micro-structure Soft Lithography Technology

Printing Depth Modeling, Printing Process Quantification and Quick-Decision of Printing Parameters in Micro-Vat Polymerization

Photolithography Using Lateral Surface of Nanofibers

Method for Obtaining Light Curing Printing Condition Based on New Theoretical Description

Mitigation and control of the overcuring effect in mask projection micro-stereolithography

Micro-Fabrication and Monitoring of Three-Dimensional Microstructures Based on Laser-Induced Thermoplastic Formation

Experimental Research on CO_2 Laser Direct-writing Machining PMMA Microchannel

Hybrid-Light-Source Stereolithography for Fabricating Macro-Objects With Micro-Textures

Effect of ultraviolet post-curing, laser power, and layer thickness on the mechanical properties of acrylate used in stereolithography 3D printing

Modeling and measurement of curing properties of photocurable polymer containing magnetic particles and microcapsules

High-resolution stereolithography: Negative spaces enabled by control of fluid mechanics

Preparation and Study of Stereolithography Photosensitive Resin Based on 405 Nm Uv Light Source

Volume Shrinkage and Conversion Rate of Al2O3 Ceramic Stereolithography Suspension Polymerised by Ultraviolet Light

Preparation of a Novel Cationic Photosensitive Resin (3D-SLR01) for Stereolithography 3D Printing and Determination of Its Some Properties