Abstract:A Si diffusion layer on grain-oriented low-silicon steel substrates was produced by pulse electrodeposition in KCl-NaCl-NaF-SiO2 molten salt and the effect of current density upon the composition and microstructure of the siliconized layer was investigated. The results showed that by glow discharge spectrometry (GDS), the change of Si content of siliconized layers was similar in the range of 20-60 mA/cm2. Si content in the surface was maximum, and then dropped sharply within the surface layer (< 7 m). The Si content remained nearly constant in the middle part of the siliconized layer. The content of Si near to the substrate decreased relatively slowly. The Si content in the surface and the layer thickness increased with increasing current density. Cross-sectional observations revealed that the Si diffusion layers had a two-layer structure: the top layer composed of columnar grains grown perpendicularly to the substrate surface and a transition layer with equiaxed grains was close to the substrate. In addition, the thickness of the layer was too small when the current density was 20 mA/cm2, while the layer became more porous as the current increased from 40 to 60 mA/cm2 according to SEM observations. The optimum current density for deposition was 30 mA/cm2.

Effect of the Duty Cycle on Boronized Layer Formed by Pulse Electrodeposition

Influence of Duty Cycle on Composition and Microstructure of Siliconized Layer Using Pulse Electrodeposition

Effect of Current Density on Composition and Microstructure of Boronized Layer by Electrodeposition

Influence of Pulse Electrodeposition Parameters on Thickness of Boronized Layer by Orthogonal Test

Effect of Borax Content on Composition and Microstructure of Boride Layer by Electrodeposition

Effect of Boron on Composition and Microstructure of the Siliconized Layers Prepared by Electrodeposition in Molten Salts

Growth kinetics of boride layer by molten salt electrodeposition

Effect of Duty Cycle on Ni-Cr-Mo Alloy Coating Prepared by Pulse Electroplating

Effects Of Electrolytic Parameters On The Deposition Of Boron At The Cathode During Molten Salt Electrolysis Of Silicon

Effects of duty cycle on microstructure and mechanical properties of (AlCrNbSiTi)N high-entropy nitride hard coatings deposited by pulsed arc ion plating

Effect of Duty Cycle on Zn-Ni-Mn Alloy Coating Prepared by Pulse Electroplating

Influence of Boron-doping on Electrical Properties of Na-Si:H Thin Film Prepared by PECVD

Effect of carbon and nitrogen diffusion zone on growth mechanism of boride layer produced on Q235 Steel

The effect of duty cycle on the mechanical and electrochemical corrosion properties of multilayer CrN/CrAlN coatings produced by cathodic arc evaporation

Molten salt pulse electrodeposition of silicon on low silicon steel

Influence of material type and surface roughness of substrate on boronization and its performance

The Effect of the Ramping Rate on Oxygen Precipitation and the Denuded Zone in Heavily Doped Czochralski Silicon

Process Optimization and Structural Characterization of Fe3Si Layer by Pulse Electrodeposition

Effect of Current Density on Composition and Microstructure of Si Diffusion Layer by Electrodeposition

The Effect of Boron Doping on Structure and Electrochemical Performance of Lithium-Rich Layered Oxide Materials.

Growth Kinetics and Microstructure of Siliconized Layer by Molten Salt Electrodeposition