Laser-Induced Selective Electroless Plating of Copper on Semiconductor Silicon

CHEN Yi-fang,YUAN Cheng-chao,JIANG Hua,ZHANG Yuan-ming,CHEN Yun-fei
DOI: https://doi.org/10.3969/j.issn.1671-4776.2006.03.009
2006-01-01
Abstract:Electroless deposition of copper using YAG laser on the n-type silicon is introduced.In the process,the laser was first used to ablate metal micro-patterns,then the created micro-pattern was used to deposite copper through electroless deposition process to form the final copper microstructures over the n-type silicon substrate.Palladium ions are added as mediators in the electroless plating solution to enable a continuous electroless copper deposition.The experiments showed that,the procedures of pretreatment and post-cleaning are the key factors that affected the selective ability of electroless metal plating.The samples should be cleaned by acetone or diluted nitric acid to get distinct micro-patterns.
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