Research on the Method of Fabricating DOE by Digital Lithography System with Mutipedots Scanning

FANG Liang,DUAN Xi,GUO Xiao-wei,WANG Jing-quan,ZHANG Zhi-you,DU Jing-lei
DOI: https://doi.org/10.3969/j.issn.0490-6756.2007.06.034
2007-01-01
Abstract:Gray-tone point arry can be obtained by introducing a microlens array into DMD(Digital Micromirror Device)digital lithography system.At the time of exposure,the substrate scans synchronously by a designed mode in order to form a desirable exposure field.Using this system to fabricate DOE could obtain a high-quality consecutive microstructure conveniently and swiftly.In this paper,the scan parameters of substrate and simulation results that were suitable for fabricating Fresnel diffractive microlen were given out through the analysis and calculation of the scan mode,which provids a basis for the use of this system to fabricate DOE practically.
What problem does this paper attempt to address?