High-fidelity Moulding Growth and Cross-section Shaping of Ultrathin Monocrystalline Silicon Nanowires
Yifei Liang,Wentao Qian,Ruijin Hu,Xin Gan,Shuqi Shi,Yating Li,Junzhuan Wang,Zongguang Liu,Daowei He,Yi Shi,Jun Xu,Kunji Chen,Linwei Yu
DOI: https://doi.org/10.1016/j.apsusc.2023.157635
IF: 6.7
2023-05-31
Applied Surface Science
Abstract:Catalytic growth of ultrathin silicon nanowires (SiNWs) provides ideal 1D channel materials for the construction of high-performance field effect transistors, where the diameter, uniformity and crystalline qualities are of utmost importance. In this work, a high-fidelity moulding growth of orderly ultrathin monocrystalline SiNWs, with diameter of 17±2nm , has been accomplished within tightly confined nanogrooves. A continuous and deterministic groove-width-transition or squeezing strategy has also been developed to accomplish an effective cross-section tailoring of the as-grown SiNW channels, while enabling a close-to-unity growth filling rate within the guiding grooves. Finally, a size-dependent adatom-searching model is proposed to explain how a monocrystalline SiNWs can be obtained even at such a low growth temperature of <350 °C. These results indicate a feasible catalytic growth fabrication route to implement monolithic 3D integration of advanced in-memory-computing and neuromorphic electronics.
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films