Abstract:Silica glass ingot synthesis by flame hydrolysis deposition (FHD) is an important approach to obtain high-purity synthetic silica glass with high refractive index homogeneity. Using the precursor of silicon tetrachloride (SiCI4), the silica ingot (SiO2) can be synthesized in the oxy-hydrogen diffusion flame through a set of kinetic reactions and subsequent cooling. The homogeneity of the synthetic silica glass is influenced by the temperature/diameter equality of silica droplets and the residue of radicals (e.g. OH) in the synthetic silica. In this study, the mixing system of oxy-hydrogen diffusion flame and silica droplets in a furnace were modeled by a Euler-Lagrange multi-phase model, where the interphase exchange of mass, momentum and energy between the gas phase molecules and liquid phase silica droplets during the formation and transportation of silica droplets were included. The silica droplets were tracked by a Lagrangian formulation that includes the discrete phase inertia, hydrodynamic drag, the force of gravity and the dispersion due to turbulent eddies. The molecular gas phase reactions are described by a simple kinetic mechanism involving the major species during the formation of molecular SiO2, with kinetic and thermodynamic parameters taken from the literature when available.The effect of initial equivalence ratio on the flame structure was analyzed in the study, where the high-temperature region is uniform over the glass ingot and the residue is limited at unity equivalence ratio. The probability distributions of silica droplet diameter and temperature were analyzed by employing a developed droplet growth model, where the condensation rate is controlled by the in situ SiO2 vapor concentration and the local flow-condition-determined mass transfer rate. The maximum diameter of silica droplets in the furnace is 1.39 x 10(-4) m, and the percentage of silica droplets decreases with the increasing of diameter. Two high probability regions were observed for the droplet temperature distribution, the temperature below 1500 K accounts for 40% of the total droplet number, and the temperature range between 3500 and 4500 K accounts for 58%. The droplet diameter on the ingot cap distributes in the range from 4 x 10(-5) to 9 x 10-5 m with approximately probability of 85%. The distribution of droplet temperature on the ingot cap is much uniform, with more than half (67%) of the droplets has the temperature between 3100 and 3200 K. (C) 2014 Elsevier Ltd. All rights reserved.

Characterization of Ge-doped silica films with low optical loss grown by flame hydrolysis deposition

Visible Room-Temperature Photoluminescence of Ge-doped SiO2 Glasses Fabricated by a Sol–gel Process

Sol–gel preparation of Ge nanocrystals embedded in SiO2 glasses

The UV-induced positive and negative refractive index changes in GeO<sub>2</sub>-SiO<sub>2</sub> films

Optical properties of GeO[SiO] and GeO[SiO2] solid alloy layers grown at low temperature

Effects of Germanium Content on Sol-Gel GeO2/γ-glycidoxypropyltrimethoxysilane Hybrid Planar Waveguides Prepared at Low Temperature

Preparation and Characterization of Sol–gel Processed GeO2/methyltrimethoxysilane Hybrid Thin Films

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Oxygen Precipitation in Ge-doped Czochralski-silicon at 900 °C Investigated by in Situ High Energy X-Ray Diffraction

Characterization of a Czochralski Grown Silicon Crystal Doped with 1020 Cm‐3 Germanium

Optical and structural properties of Ge-ion-implanted fused silica after annealing in different ambient conditions

Structure and optical properties of GeGaS films deposited by thermal evaporation

Photoluminescence Properties of Dy3+-doped Oxyfluoride Germanosilicate Optical Glass-Ceramics

GeO2/organically Modified Silane Sol-Gel Hybrid Organic-Inorganic Films for Photonic Applications

MICROSTRUCTURE AND OPTICAL PROPERTIES OF ERBIUM DOPED SILICA-BASED FILMS VIA FLAME HYDROLYSIS DEPOSITION AND AEROSOL DOPING

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Ge-doped Silica Nanoparticles: Production and Characterisation

Modeling Analysis on the Silica Glass Synthesis in A Hydrogen Diffusion Flame

Ge-Ga-S-CdS Amorphous Films Prepared by Pulsed Laser Deposition

Sol–gel fabrication of GeO2/ormosils organic–inorganic hybrid material channel waveguides

Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition