Abstract:We have investigated the potential of self-assembled monolayer (SAM) coatings for the purpose of adhesion reduction in microelectromechanical systems (MEMS). Two types of SAM coatings, derived from the precursor molecules octadecyltrichlorosilane [CH/sub 3/(CH/sub 2/)/sub 17/SiCl/sub 3/, OTS] and 1H,1H,2H,2H-perfluorodecyltrichlorosilane [CF/sub 3/(CF/sub 2/)/sub 7/(CH/sub 2/)/sub 2/SiCl/sub 3/, FDTS], were applied to polycrystalline silicon microstructures in a liquid-based process. Due to the hydrophobicity of these coatings, the water capillary forces responsible for the phenomenon known as release-related stiction are eliminated, and SAM-coated cantilever beams 2 /spl mu/m thick, 2 /spl mu/m above the substrate, and up to 2 mm in length emerge dry and free standing when removed from the final water rinse. The effects of SAM coating on adhesion encountered during device operation, termed in-use stiction, were characterized using arrays of cantilever beams of varying lengths. Structures made with a polycrystalline silicon of 3-nm rms roughness gave apparent works of adhesion of 30 and 8 /spl mu/J/m/sup 2/ for the OTS and FDTS SAM coatings, respectively, in comparison to 56 mJ/m/sup 2/ for standard oxide-coated structures. These results demonstrate that OTS coating reduces adhesion by more than three orders of magnitude over the conventional process and that the fluorinated SAM can lessen it further by four times. With regard to thermal stability, both SAM coatings can withstand heat treatment for 5 min at 450/spl deg/C in an N/sub 2/ ambient. In air, the OTS film begins to degrade at 150/spl deg/C while the fluorinated coating remains intact up to 400/spl deg/C. Therefore, both types of SAM coatings are compatible with several MEMS packaging techniques, with the FDTS monolayers exhibiting superior stiction and thermal stability properties to those derived from OTS. Furthermore, the FDTS formation does not require any chlorinated solvents such as carbon tetrachloride, which has been banned from industrial use, making the latter coating an industrially viable antistiction treatment.

Differentiation of field-induced and native oxide using selective formation of self-assembled monolayer

Friction and Wear Studies of Octadecyltrichlorosilane SAM on Silicon

Silicon Dioxide Deposition by Atmospheric Pressure and Low‐Temperature CVD Using TEOS and Ozone

Subatmospheric chemical vapor deposition ozone/TEOS process for SiO2 trench filling

Characterization of A Homogeneously Mixed Octyltriethoxyilane/Octadecyltrichlorosilane Self-Assembled Monolayer and Analysis of Its Formation Mechanism

Topographical and Performance Characterization of OTS Self-assembled Monolayer on Chemically Textured Silicon Surfaces

Construction of the Homogeneously Mixed SAM Composed of Octyltriethoxysilane and Octadecyltrichlorosilane by Taking Advantage of the Molecular Steric Restriction

Spatial resolution in thin film deposition on silicon surfaces by combining silylation and UV/ozonolysis

Formation of alkylsiloxane self-assembled monolayers on Si3N4

Formation of superhydrophobic polymerized n-octadecylsiloxane nanosheets.

Growth Mechanisms of Fluoroalkyltrlchlorosilane Self-Assembled Monolayers on the Magnetic Head Surface

Fabrication of Surfaces with Nanoislands of Chemical Functionality by the Phase Separation of Self-Assembling Monolayers on Silicon

Preparation and Tribological Behaviors of an Amide-Containing Stratified Self-Assembled Monolayers on Silicon Surface

Alkyltrichlorosilane-based self-assembled monolayer films for stiction reduction in silicon micromachines

Deposition of phospholipid layers on SiO2 surface modified by alkyl-SAM islands

Mixed Functional Siloxane Monolayers Prepared via Chemical Vapor Deposition

Preparation of Hydrophobic/Superhydrophobic Surface on Silicon Wafer by Reactive Ion Etching and Self-assembled Monolayers

Area Selective Atomic Layer Deposition by Soft Lithography

Self-assembling of Cyano- and Carboxyl-Terminated Monolayers Using Short-Chain Alkylsiloxane

Self-assembled monolayers preparation of HfO_2 thin film

CHARACTERIZATION OF OCTADECYLTRICHLOROSILANE SELF-ASSEMBLED MULTILAYERS ON PYREX GLASS