Abstract:The characterization of nanostructured surfaces with sensitivity in the sub-nm range is of high importance for the development of current and next-generation integrated electronic circuits. Modern transistor architectures for, e.g., FinFETs are realized by lithographic fabrication of complex, well-ordered nanostructures. Recently, a novel characterization technique based on X-ray fluorescence measurements in grazing incidence geometry was proposed for such applications. This technique uses the X-ray standing wave field, arising from an interference between incident and the reflected radiation, as a nanoscale sensor for the dimensional and compositional parameters of the nanostructure. The element sensitivity of the X-ray fluorescence technique allows for a reconstruction of the spatial element distribution using a finite element method. Due to a high computational time, intelligent optimization methods employing machine learning algorithms are essential for timely provision of results. Here, a sampling of the probability distributions by Bayesian optimization is not only fast, but it also provides an initial estimate of the parameter uncertainties and sensitivities. The high sensitivity of the method requires a precise knowledge of the material parameters in the modeling of the dimensional shape provided that some physical properties of the material are known or determined beforehand. The unknown optical constants were extracted from an unstructured but otherwise identical layer system by means of soft X-ray reflectometry. The spatial distribution profiles of the different elements contained in the grating structure were compared to scanning electron and atomic force microscopy and the influence of carbon surface contamination on the modeling results were discussed. This novel approach enables the element sensitive and destruction-free characterization of nanostructures made of silicon nitride and silicon oxide with sub-nm resolution.

In Situ Measurement of Annealing-Induced Line Shape Evolution in Nanoimprinted Polymers Using Scatterometry

Scatterometry for in Situ Measurement of Pattern Reflow in Nanoimprinted Polymers

Grazing-incidence Small Angle X-Ray Scattering Studies of Nanoscale Polymer Gratings

Nondestructive Metrology for Nanoimprint Processes

Influence of Molecular Weight and Processing Conditions on the Thermal Stability of Nanoimprinted Polymer Structures

Polymer Viscoelasticity and Residual Stress Effects on Nanoimprint Lithography

Relaxation behavior of polymer structures fabricated by nanoimprint lithography.

Brillouin Scattering Studies of Polymeric Nanostructures

Enhanced Thermal Stability of Thermoplastic Polymer Nanostructures for Nanoimprint Lithography

Stability And Surface Topography Evolution In Nanoimprinted Polymer Patterns Under A Thermal Gradient

Molecular dynamics simulation study of the degradation of polymer nanopatterns created by nanoimprint

Shape- and Element-Sensitive Reconstruction of Periodic Nanostructures with Grazing Incidence X-ray Fluorescence Analysis and Machine Learning

Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns

In Situ Optical Characterizations of the Annealing Effects Upon Sno2: F Films by Spectroscopic Ellipsometry

NANOIMPRINT TECHNOLOGY : RECENT PROGRESS AND APPLICATIONS

Imaging Scatterometer for Observing In-Situ Changes to Optical Coatings During Air Annealing

Implementation of Two Distinct Wavelengths to Induce Multistage Polymerization in Shape Memory Materials and Nanoimprint Lithography

48.1: Inline Low Temperature Polycrystalline Silicon Roughness and Grain Size Metrology Enabled by Electron Beam Review for a Better Process Control of Excimer Laser Annealing

Small-Angle Neutron Scattering of P(NDI2OD-T2) Solutions: Importance of Network Structure for Data Interpretation and Film Morphology

X-ray verification of sol-gel resist shrinkage in substrate-conformal imprint lithography for a replicated blazed reflection grating

Ultrafast Patterning Of Nanostructures In Polymers Using Laser Assisted Nanoimprint Lithography