Abstract:Optical metrology is widely used to characterize surface deformations due to the noncontact, full-field, and highly accurate nature of the measurements. In combination with advanced microscopes, optical metrology methods have recently been extended into the microand nanoscales. In measurements that use the moiré (beat pattern produced between gratings of initially equal spacing) method,1–3 gratings act as sensors that record the original deformation of a specimen. Precise preparation of the gratings is therefore required to ensure accurate measurements. Existing technologies for grating fabrication do not meet all the necessary requirements (i.e., production of high-frequency and large-area gratings at low cost) simultaneously. Ordinary photolithography, due to its diffraction limitation, can generally only produce gratings with hundreds of lines per millimeter. Holographic lithography can be used to make gratings with frequencies of up to 4800 lines per millimeter, but there are strict requirements on the optical system and the alignment techniques. Electron beam lithography and focused ion beam lithography can produce fine gratings with up to 10,000 lines per millimeter, but the grating area is very small (micrometer scale).4, 5 We have developed a new moiré grating fabrication method that is based on the nanoimprint lithography (NIL) technique.6 NIL creates nanoscale patterns through mechanical deformation and has low costs, high throughput, and high resolution. This process has already been used in several microelectronic engineering, optical engineering, and bioengineering applications. Our technique can be used to produce gratings with large areas and high frequencies on different specimens, and at fast rates (see Figure 1).7–9 The preparation of the stamp that is used for imprinting is a key issue in our method. When imprinting is conducted at low pressure, a full-contact condition (between the specimen and Figure 1. (a) Grating fabricated on a traditional (millimeter-scale dimensions) specimen (1200 lines per millimeter, cross type).7 (b) Grating fabricated on a thin (<1 m) film specimen (1200 lines per millimeter, cross type).8

X-ray verification of sol-gel resist shrinkage in substrate-conformal imprint lithography for a replicated blazed reflection grating

Optimization and Fabrication of Chromium Grating in Self-Traceable Interferometer

Extreme Ultraviolet and Soft X-Ray Diffraction Efficiency of a Blazed Reflection Grating Fabricated by Thermally Activated Selective Topography Equilibration

Optimization of Grayscale Lithography for the Fabrication of Flat Diffractive Infrared Lenses on Silicon Wafers

Grazing-incidence Small Angle X-Ray Scattering Studies of Nanoscale Polymer Gratings

Applied Nanofabrication for X-ray Grating Spectroscopy

Fabrication of Slanted Gratings with High Refractive Index Starting from Master Nanoimprint Mold.

Limiting Spectral Resolution of a Reflection Grating Made via Electron-Beam Lithography

Fabrication of 150 Nm Half-Pitch Grating Templates for Nanoimprint Lithography

Towards the Fabrication of High-Aspect-Ratio Silicon Gratings by Deep Reactive Ion Etching

Demonstration of High-Performance, Sub-Micron Chalcogenide Glass Photonic Devices by Thermal Nanoimprint

In Situ Measurement of Annealing-Induced Line Shape Evolution in Nanoimprinted Polymers Using Scatterometry

Design and Fabrication of Silicon-Blazed Gratings for Near-Infrared Scanning Grating Micromirror

Large Area Direct Nanoimprinting of SiO2–TiO2 Gel Gratings for Optical Applications

In Situ Monitoring for Development of Rectangular Photoresist Gratings on Transparent Substrates

The Design, Fabrication and Performance of A Large Area 10000 Line/Mm Metal Transmission Diffraction Gratings for Soft X-Ray

Fabrication of a concave grating with a large line spacing via a novel dual-beam interference lithography method

Toward volume manufacturing of high-performance soft x-ray critical-angle transmission gratings

Small angle x-ray scattering metrology for sidewall angle and cross section of nanometer scale line gratings

Self-aligned fabrication of high-aspect ratio high-resolution x-ray gratings

Fabrication of High-Density Moiré Gratings