Preparation and Characterization of Room-Temperature Ferromagnetism GaMnN Based on Ion Implantation

Jiqing Wang,Pingping Chen,Zhifeng Li,Xuguang Guo,H. Makino,T. Yao,Hong Chen,Qi Huang,Junming Zhou,Wei Lu
DOI: https://doi.org/10.1360/02yw0192
2003-01-01
Abstract:This paper reports the fabrication of GaMnN ferromagnetic semiconductor on GaN substrate by high-dose Mn ion implantation. Both the structural and optical properties for Mn+-implanted GaN material were studied by X-ray diffraction, Raman scattering and photoluminescence. the results reveal that the implanted manganese incorporates on Ga site and GaMnN ternary phase is formed in the substrate. The magnetic behavior has been characterized by superconducting quantum interference device. The material shows room-temperature ferromagnetism. The temperature-dependent magnetization indicates different mechanism for ferromagnetism in Mn+-implanted GaN.
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