ISO TR 22335:2007 experimental comparison

Yao Wenqing
DOI: https://doi.org/10.3969/j.issn.1002-4956.2013.04.054
2013-01-01
Abstract:It was decided at the 15th Plenary meeting of TC-201/SC4 that a 5th round robin for the ISO TC-201/SC4/SC-22335 "Sputter Mesh" standard would be undertaken.At this meeting it was further decided that SC-22335 would be changed to a "Technical Report." There are 9 countries in the group member;they are China,Hungary,Japan,UK,USA,Switzerland,R.O.Korea,Philippines and Russia.There are 6 laboratories of three countries that participated in the experiment comparison,including one in China,one in Japan and one in USA.The standard deviation by AES in Tsinghua University of China is the most closed to the actual value on sputtering interface.After comparing the inside aperture(IA) and outside aperture(OA) sputter rate,the(IA) is 0.06 min and the(OA) is 0.03 min;the oxide layer thickness is 0.4 nm.
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