Superposed forward current–voltage characteristics in TbMnO3/n-Si and TbMnO3/p-Si heterostructures

Yimin Cui,Rongming Wang
DOI: https://doi.org/10.1016/j.tsf.2009.04.061
IF: 2.1
2009-01-01
Thin Solid Films
Abstract:TbMnO3/n-Si (n–N) and TbMnO3/p-Si (p–n) heterojunctions were fabricated under identical conditions. Good rectifying characteristics were found with almost the same forward current–voltage behavior in a temperature range from 150 to 300 K. Such intriguing superposed rectifying behaviours at the interfaces between TbMnO3 and Si of two different doped types can be explained by a similar Schottky barrier diode behavior with its current–voltage dependence generally dominated by only one type of carrier. This work will favor both electronic transport analysis and future device applications.
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