Abstract:Boron carbon nitride (BCN) films were deposited on silicon substrates by radio frequency (r.f.) (13.56 MHz) magnetron sputtering from hexagonal boron nitride (h-BN) and graphite targets in an Ar-N-2 gas mixture of a constant pressure of 1.0 Pa. During deposition, the substrates were maintained at a temperature of 400 degrees C and negatively biased using a pulsed voltage with a frequency of 330 kHz. Different analysis techniques such as X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), Fourier transform infrared spectroscopy (FLTIR), Raman spectroscopy, X-ray diffraction (XRD) and scanning Auger electron microscopy (SAM) were used for characterization. In addition, the mechanical and tribological properties of the films were investigated by nano-indentation and micro-scratching. The carbon concentration in the films could be adjusted by the coverage area of a graphite sheet on the h-BN target, and decreased with increasing bias voltage. It was found that the ternary compound films within the B-C-N composition triangle possessed a less ordered structure. B-N, B-C and C-N chemical bonds were established in the films, and no phase separation of graphite and h-BN occurred. At zero bias voltage, amorphous BC2N films with atomically smooth surface could be obtained, and the microfriction coefficient was 0.11 under a normal load of 1000 mu N. Hardness as determined by nano-indentation was usually in the range of 10-30 GPa, whereas the Young's modulus was within 100-200 GPa. (C) 2000 Elsevier Science S.A. All rights reserved.

Synthesis and characterization of boron carbon nitride films by radio frequency magnetron sputtering

Mechanical Properties and Bonding Structure of Boron Carbon Nitride Films Synthesized by Dual Ion Beam Sputtering

A Study of Nano-Mechanical Properties and Nano-Scratch Behavior of Boron Carbonitride Films.

Characterization and optical investigation of BCN film deposited by RF magnetron sputtering

Study of Nanomechanical Properties and Nanotribological Behavior of BCN Films Deposited by Magnetron Sputtering

Preparation of Boron Carbon Nitride Thin Films by Radio Frequency Magnetron Sputtering

Synthesis of Boron Carbonitride Films by Plasma-Based Ion Implantation

Composition and Structure of BCN Films Prepared by Ion Beam-Assisted Pulsed Laser Deposition

Preparation of cubic boron nitride films by radio frequency magnetron sputtering and radio frequency ion plating

Effect of Composition on Structure and Nano-mechanical Properties of BCN Films

Synthesis of BCN thin films by nitrogen ion beam assisted pulsed laser deposition from a B4C target

Ternary BCN Thin Films Deposited by Reactive Sputtering

Turbostratic Boron Carbonitride Films Produced by Bias-Assisted Hot Filament Chemical Vapor Deposition

Optical & Electronic Properties of Carbon Nitride Thin Films

Preparation and Characterization of Thick Cubic Boron Nitride Films

BN Films Deposited by HFPECVD and the Mechanism of the Process

Transition from amorphous boron carbide to hexagonal boron carbon nitride thin films induced by nitrogen ion assistance

Structural and Mechanical Properties of a-BCN Films Prepared by an Arc-Sputtering Hybrid Process

Preparation of Cubic Boron Nitride Films by Radio Frequency Sputtering

Investigation of BCN Films Deposited at Various$hboxN_2/hboxAr$Flow Ratios by DC Reactive Magnetron Sputtering

Electron Cyclotron Resonance Plasma-Assisted Pulsed Laser Deposition of Boron Carbon Nitride Films