Abstract:Chemical vapor deposition (CVD) is a crucial technique in the preparation of high-quality thin films and coatings, and is widely used in various industries including semiconductor, optics, and nuclear fuel, due to its operation simplicity and high growth rate. The complexity of the CVD process arises from numerous parameters, such as precursor chemistry, temperature, pressure, gas flow dynamics, and substrate characteristics. These multiscale parameters make the optimization of the CVD process a challenging task. Numerical simulations are widely used to model and analyze the CVD complex systems, and can be divided into nanoscale, mesoscale, and macroscale methods. Numerical simulation is aimed at optimizing the CVD process, but the inter-scale parameters still need to be extracted in modeling processes. However, multiscale coupling modeling becomes a powerful method to solve these challenges by providing a comprehensive framework that integrates phenomena occurring at different scales. This review presents an overview of the CVD process, the common critical parameters, and an in-depth analysis of CVD models in different scales. Then various multiscale models are discussed. This review highlights the models in different scales, integrates these models into multiscale frameworks, discusses typical multiscale coupling CVD models applied in practice, and summarizes the parameters that can transfer information between different scales. Finally, the schemes of multiscale coupling are given as a prospective view. By offering a comprehensive view of the current state of multiscale CVD models, this review aims to bridge the gap between theory and practice, and provide insights that could lead to a more efficient and precise control of the CVD process.

Multi-Scale Modeling and Numerical Simulation for Cvi Process

Numerical Simulation of Isothermal Chemical Vapor Infiltration Process for Fabrication of C/Sic Composites

Homogenization for Chemical Vapor Infiltration Process

Numerical simulation for fabrication of C/SiC composites in isothermal CVI reactor

A Virtual Scale Approach to Multi-Scale Calculations and Its Application in Fiber-Reinforced Composites

Multi-physical Field Coupling Simulation of TCVI Process for Preparing Carbon/carbon Composites

Numerical simulation of effects of reactor dimensions on isothermal CVI process of C/SiC composites

Comparative Modeling of Gas Transport in Isothermal Chemical Vapor Infiltration Process of C/SiC Composites

Present Status of Numerical Simulation of CVI Process for Carbon-Carbon Composites

Densification Process for Thermal Gradient CVI Fabricating C/C Composites Based on Numerical Simulation

Robust Numerical Simulation of Porosity Evolution in Chemical Vapor Infiltration III: Three Space Dimension

A Multiscale Model for CVD Growth of Silicon Carbide

Numerical simulation of thermal-gradient CVI process for C/C composite

Multiscale Models of CVD Process: Review and Prospective

Homogenization of a Discrete Network Model for Chemical Vapor Infiltration Process

A Numerical Study of Densification Behavior of Silicon Carbide Matrix Composites in Isothermal Chemical Vapor Infiltration

Modeling of chemical vapor infiltration process for fabrication of carbon–carbon composites by finite difference methods

Modeling the effects of reactor wall reaction on isothermal CVI process of C/SiC composites

Modeling The Effects Of Reactor Inlet Configuration On Isothermal Cvi Process Of C/Sic Composites

Monte-carlo modeling for grain growth process in Vapor-Liquid-Solid phase sintered materials

Numerical Simulation of Effect of Methyltrichlorosilane Flux on Isothermal Chemical Vapor Infiltration Process of C/Sic Composites