Study of Carbon Nano-Tube Photo-electronic Devices by Nano-Imprint Lithography

Hongzhong Liu,Yucheng Ding,Lei Yin,Bingheng Lu,Duowang Fan
DOI: https://doi.org/10.1109/inow.2007.4302988
2007-01-01
Abstract:Nano-imprint lithography (NIL) technology is presented to fabricate carbon nano-tube (CNT) arrays for field emission (FE) and sensor devices by process control and optimization. Results reveal that the CNT arrays are high resolution and fidelity.
What problem does this paper attempt to address?