Temporal Profile of Optical-Transmission Probe for Pulsed-Laser Heating of Amorphous-Silicon Films

HK PARK,XF XU,CP GRIGOROPOULOS,N DO,L KLEES,PT LEUNG,AC TAM
DOI: https://doi.org/10.1063/1.107786
IF: 4
1992-01-01
Applied Physics Letters
Abstract:The transient temperature field development during heating of an amorphous silicon (a-Si) film, deposited on a fused quartz substrate by pulsed excimer laser irradiation is studied. Experimental optical transmission data are compared with heat transfer modeling results. The temperature-dependence of the material complex refractive index through the thin film thickness is taken into account.
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