Design and Fabrication of Ultrasmall Arrayed Waveguide Grating Multiplexers Based on Si Nanowire Waveguides

Dai Dao-xin,Liu,Zhen Sheng,He Sai-ling
DOI: https://doi.org/10.1007/s11801-007-6139-7
2007-01-01
Optoelectronics Letters
Abstract:The large refractive index difference between Si and SiO2 makes it possible to realize ultrasmall photonic integrated circuits. A 5 × 5 ultracompact arrayed waveguide grating multiplexer based on 500×250 nm Si nanowire waveguides is designed and fabricated by using the technologies of E-beam writing and amorphous-Si deposition. The measured channel spacing is about 1.5 nm (close to the design value) and the channel crosstalk is about −8 dB.
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