Abstract:Silicon carbon nitride thin films were deposited on Co-Cr alloy under varying deposition conditions such as sputtering power and the partial pressure ratio of N(2) to Ar by radio frequency and direct current magnetron sputtering techniques. The chemical bonding configurations, surface topography and hardness were characterized by means of X-ray photoelectron spectroscopy, atomic force microscopy and nano-indentation technique. The sputtering power exhibited important influence on the film composition, chemical bonding configurations and surface topography, the electro-negativity had primary effects on chemical bonding configurations at low sputtering power. A progressive densification of the film microstructure occurring with the carbon fraction was increased. The films prepared by RF magnetron sputtering, the relative content of the Si-N bond in the films increased with the sputtering power increased, and Si-C and Si-Si were easily detachable, and C-O, N-N and N-O on the film volatile by ion bombardment which takes place very frequently during the film formation process. With the increase of sputtering power, the films became smoother and with finer particle growth. The hardness varied between 6 GPa and 11.23 GPa depending on the partial pressure ratio of N(2) to Ar. The tribological characterization of Co-Cr alloy with Si-C-N coating sliding against UHMWPE counter-surface in fetal bovine serum, shows that the wear resistance of the Si-C-N coated Co-Cr alloy/UHMWPE sliding pair show much favourable improvement over that of uncoated Co-Cr alloy/UHMWPE sliding pair. This study is important for the development of advanced coatings with tailored mechanical and tribological properties. Crown Copyright (C) 2011 Published by Elsevier B.V. All rights reserved.

Surface Morphology of Α-Sic Coatings Deposited by RF Magnetron Sputtering

Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering

Influence of radio frequency magnetron sputtering parameters on the structure and performance of SiC films

Characterization of Microstructures and Properties of TiSiN Coatings Deposited by RF Magnetron Sputtering

SiC film deposition by DC magnetron sputtering

Effects of Sputtering Parameter on the Microstructure of Ti-6al-4v Coating on Sic Fibre

Growth Dynamics and Characterization of SiC Quantum Dots Synthesized by Low-Frequency Inductively Coupled Plasma Assisted Rf Magnetron Sputtering

Superior Ablation Resistance of Plasma Sprayed SiC Based Coating by Structural Optimized Powders

Effect of Heat Treatment on the Interfacial Bonding Between SiC Coating and Alumina Plate

XPS Analysis of SiC Films Prepared by Radio Frequency Plasma Sputtering

Study of 3C-Sic and 4H-Sic Films Deposited Using RF Sputtering Method

The Structure, Surface Topography and Mechanical Properties of Si–C–N Films Fabricated by RF and DC Magnetron Sputtering

A Study of the Microstructure and Mechanical Properties of Sic Coatings on Spherical Particles

Influence of Sputtering Process on the Deposition and Optical Properties of Sicn Films

Investigation of Amorphous-Sic Thin Film Deposition by RF Magnetron Sputtering for Optical Applications

Effects of Deposition Conditions on the Morphology and Composition of CVD SiC Coating

Surface Morphology And Interface Reaction Of Cu/Sio2/Si (111) Systems Prepared By Radio Frequency Magnetron Sputtering

Effect of Sputtering Power on the Structure and Optical Band Gap of SiC Thin Films

Surface Characteristics of Ni–Ga–Fe Sputtered Thin Films

Surface characteristics of Ni-Mn-Fe-Ga sputtered thin films