Abstract:Dielectrically loaded thin-film lithium niobate (LiNbO3) on insulator (LNOI) platforms have enabled a range of photonic integrated circuit components, such as high-speed optical modulators, switches, and nonlinear devices, while avoiding the direct etching of the LiNbO3 thin film. Silicon nitride (Si3N4) is one of the most attractive dielectric loading materials as it has a similar refractive index and transparency window to LiNbO3 and can be deposited and patterned by mature fabrication processes. The patterning of Si3N4 opens the opportunity to fabricate grating couplers in the same fabrication step, providing efficient optical interfaces for wafer-scale testing. In this paper, we investigate and demonstrate single-step etched grating couplers on a Si3N4-LNOI (X-cut) platform. The grating couplers (straight and curved) are designed and fabricated for TE-polarized modes along the Y and Z crystallographic directions, considering the LiNbO3 crystal’s birefringence. The experimentally demonstrated coupling losses are as low as 4.02 and 4.24 dB along the crystallographic Y and Z directions, respectively. The corresponding peak wavelengths are 1609 and 1615 nm, respectively. The measured 3-dB bandwidths are wider than 70 nm for both crystallographic directions. We also numerically investigated the influence of fabrication variations and the fiber angle on the transmission. To the best of our knowledge, this work is the first demonstration of grating couplers with different light propagation directions on the Si3N4 loaded LNOI platform.

Fabrication of $\bf LiNbO_{3}$ Phase Gratings by Excimer Laser Ablation through a Silica Phase Mask

Linbo3 Phase Gratings Prepared by A Single Excimer Pulse Through A Silica Phase Mask

LiNbO3 grating couplers fabricated by one excimer laser pulse through a diffractive optical element

Lithium–Niobate Channel Waveguide for the Realization of Long-Period Gratings

Fabrication of LiTaO3 periodic surface structures by a single excimer laser pulse through a phase mask grating

Fabrication of Lithium Niobate Fork Grating by Laser-Writing-induced Selective Chemical Etching

Photonic crystal fabrication in lithium niobate via pattern transfer through wet and dry etched chromium mask

Pulsed Laser Deposition of Optical Waveguiding LiNbO 3 Films on SiO 2 Substrate

Growth of LiNbO3 Optical Waveguide Films by Excimer Laser Ablation

&Lt;title>fabrication of High-Reflectivity Fiber Bragg Gratings by Excimer Laser Irradiated Phase Masks</title>

Integrated Lithium Niobate Microring Resonators Fabricated With 515 nm Femtosecond Laser Ablation

High-Efficiency Fabrication of Geometric Phase Elements by Femtosecond-Laser Direct Writing

(012) Textured LiNbO3 Waveguiding Films Grown on SiO2 by Pulsed Laser Deposition Technique

Pulsed laser deposition of c-orientedLiNbO3LiTaO3 optical waveguiding bilayered films on silicon wafers

Single-step Etched Grating Couplers for Silicon Nitride Loaded Lithium Niobate on Insulator Platform

Optical and Structural investigations of LiNbO3 thin films by PLD

Highly C-Axis Oriented LiNbO3 Thin Film Grown on SiO2/Si Substrates by Pulsed Laser Deposition

Fabrication of beam shapers in the bulk of fused silica by femtosecond laser pulses.

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

Pulsed-Laser Deposition and Optical Properties of Completely (001) Textured Optical Waveguiding Linbo3 Films Upon Sio2/Si Substrates

Growth and Optical Photorefraction of Zr:Fe:LiNbO3 Crystals with Various [li]/[nb] Ratios at 532nm Wavelength