Synthesis of Surface Acoustic Wave Filter with Al/ZnO Thin Film Deposited on Silicon Wafer

F. Pan,J. J. Chen,F. Zeng,Y. Gao,D. M. Li
DOI: https://doi.org/10.4028/www.scientific.net/MSF.475-479.3771
2005-01-01
Materials Science Forum
Abstract:ZnO thin film, as a promising piezoelectric material, possesses unique electrical, acoustical, and optical properties. In this paper, AI/ZnO thin film was deposited on Si wafer by magnetron sputtering. Highly oriented, dense, and fine-grain polycrystalline ZnO films with excellent surface flatness and high resistivities have been obtained, when the sputtered gas pressure was 0.9 Pa, the temperature was 200 degrees C and the Ar-to-O-2 ratio was 1:3. A 780MHz surface acoustic wave filter (SAWF) has been successfully fabricated using the Al/ZnO film on silicon wafer.
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