Abstract:All-wet metal-assisted chemical etching (MACE) is a simple and low-cost method to fabricate one-dimensional Si nanostructures. However, it remains a challenge to fabricate Si nanocones (SiNCs) with this method. Here, we achieved wafer-scale fabrication of SiNC arrays through an all-wet MACE process. The key to fabricate SiNCs is to control the catalyst evolution from deposition to etching stages. Different from conventional MACE processes, large-size Ag particles by solution deposition are obtained through increasing AgNO3 concentration or extending the reaction time in the seed solution. Then, the large-size Ag particles are simultaneously etched during the Si etching process in an etching solution with a high H2O2 concentration due to the accelerated cathode process and inhibited anode process in Ag/Si microscopic galvanic cells. The successive decrease of Ag particle sizes causes the proportionate increase of diameters of the etched Si nanostructures, forming SiNC arrays. The SiNC arrays exhibit a stronger light-trapping ability and better photoelectrochemical performance compared with Si nanowire arrays. SiNCs were fabricated by using n-type 1-10 Ω cm Si(100) wafers in this work. Though the specific experimental conditions for preparing SiNCs may differ when using different Si wafers, the summarized diagram will still provide valuable guidance for morphology control of Si nanostructures in MACE processes.

Aligned 1d Silicon Nanostructure Arrays by Plasma Etching

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Uniform, Axial‐Orientation Alignment of One‐Dimensional Single‐Crystal Silicon Nanostructure Arrays

OS1503 Development of Highly Ordered Silicon Nanowire Array

Structure Transition Mechanism Of Single-Crystalline Silicon, G-C3n4, And Diamond Nanocone Arrays Synthesized By Plasma Sputtering Reaction Deposition

One-dimensional Silicon Nanostructures Fabricated by Thermal Evaporation

Growth of Single-Crystalline Silicon Nanocone Arrays by Plasma Sputtering Reaction Deposition

Composite Silicon Nanostructure Arrays Fabricated on Optical Fibre by Chemical Etching of Multicrystal Silicon Film.

Fabrication of Silicon Nanowire Arrays with Controlled Diameter, Length, and Density

Array-orderly single crystalline silicon nano-wires

Fabrication of silica nanowire bunch arrays in SiO vapor generated by oxygen plasma etching of silicon

SYNTHESIS OF ALIGNED CARBON NANOTUBES ARRAY BY RADIO FREQUENCY PLASMA-ENHANCED HOT FILAMENT CHEMICAL VAPOR DEPOSITION

Fabrication of the Highly Ordered Silicon Nanocone Array With Sub-5 nm Tip Apex by Tapered Silicon Oxide Mask

Selective etching of n-type silicon in pn junction structure in hydrofluoric acid and its application in silicon nanowire fabrication.

SCS nano-structures fabricated by hybrid process of HNA selective etching and oxidization

Large-Scale Aligned Silicon Carbonitride Nanotube Arrays: Synthesis, Characterization, and Field Emission Property

0001] oriented aluminum nitride one-dimensional nanostructures: synthesis, structure evolution, and electrical properties

Fabrication and Properties of Large-Area Silicon Nanowire Arrays

Proximal probe-like nano structuring in metal-assisted etching of silicon

Wafer-Scale Fabrication of Silicon Nanocones via Controlling Catalyst Evolution in All-Wet Metal-Assisted Chemical Etching

Aligned Stacking of Nanopatterned 2D Materials for High-Resolution 3D Device Fabrication