Abstract:Plasmonic nanoscale devices/structures have gained more attention from researchers due to their promising functions and/or applications. One important technical focus on this rapidly growing optical device technology is how to precisely control and fabricate nanostructures for different functions or applications (i.e., patterning end points should locate at/near the interface while fabricating these plasmonic nanostructures), which needs a systematic methodology for nanoscale machining, patterning, and fabrication when using the versatile nanoprecision tool focused ion beam (FIB), that is, the FIB-assisted interface detection for fabricating functional plasmonic nanostructures. Accordingly, in this work, the FIB-assisted interface detection was proposed and then successfully carried out using the sample-absorbed current as the detection signal, and the real-time patterning depth control for plasmonic structure fabrication was achieved via controlling machining time. Besides, quantitative models for the sample-absorbed currents and the ion beam current were also established. In addition, some nanostructures for localized surface plasmon resonance biosensing applications were developed based on the proposed interface detection methodology for FIB nanofabrication of functional plasmonic nanostructures. It was shown that the achieved methodology can be conveniently used for real-time control and precise fabrication of different functional plasmonic nanostructures with different geometries and dimensions.

A Practical Nanofabrication Method: Surface Plasmon Polaritons Interference Lithography Based on Backside-Exposure Technique

Single-color Peripheral Photoinhibition Lithography of Nanophotonic Structures

Photolithography Using Lateral Surface of Nanofibers

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Subwavelength Nanolithography Based on Unidirectional Excitation of Surface Plasmons

Two-Surface-Plasmon-Polariton-Absorption Based Nanolithography

248 Nm Imaging Photolithography Assisted by Surface Plasmon Polariton Interference

Focused Ion Beam Assisted Interface Detection for Fabricating Functional Plasmonic Nanostructures

Effect of Plasmonic Lens Distribution on Flight Characteristics in Rotational Near-Field Photolithography

Controlling the interactions of surface plasmon polaritons generated by two-nanoslit structures for producing diverse sub-diffraction-limited patterns

Plasmonic Interference Lithography by Coupling the Bulk Plasmon Polariton Mode and the Waveguide Mode

Two-Surface-Plasmon-Polariton-Absorption Based Lithography Using 400 Nm Femtosecond Laser

Experimental Demonstration Of Tunable Directional Excitation Of Surface Plasmon Polaritons With A Subwavelength Metallic Double Slit

Surface-plasmon-assisted nanoscale photolithography by polarized light

Self-Aligned Plasmonic Lithography for Maskless Fabrication of Large-Area Long-Range Ordered 2D Nanostructures

Forty-Nanometer Plasmonic Lithography Resolution with Two-Stage Bowtie Lens

The Steady Flying Of A Plasmonic Flying Head Over A Photoresist-Coated Surface In A Near-Field Photolithography System

2D Surface Optical Lattice Formed by Plasmon Polaritons with Application to Nanometer-Scale Molecular Deposition

Application of the Metal Reflector for Redistributing the Focusing Intensity of SPPs.

High-Speed Parallel Plasmonic Direct-Writing Nanolithography Using Metasurface-Based Plasmonic Lens

Plasmonic Interference Lithography Based on the Second-Order Diffracted Wave of Grating and Hyperbolic Multilayer Graphene