A Practical Nanofabrication Method: Surface Plasmon Polaritons Interference Lithography Based on Backside-Exposure Technique

Mingyang He,Zhiyou Zhang,Sha Shi,Jinglei Du,Xupeng Li,Shuhong Li,Wenying Ma
DOI: https://doi.org/10.1364/oe.18.015975
IF: 3.8
2010-01-01
Optics Express
Abstract:For the experiments of surface plasmon polaritons (SPPs) interference lithography based on attenuated total reflection-coupling mode to be done conveniently, we introduce a backside-exposure technique in this paper. The physical mechanisms of SPPs interference with the backside -exposure method are studied and the interference fringes with feature size below 65 nm are experimentally obtained. The technique can be used to fabricate nanostructures conveniently with large area, and avoids the difficulties for seeking high refractive prism and matching fluid.
What problem does this paper attempt to address?