Abstract:Carbon nitride films were deposited on Co/Ni-covered Si(100) wafers at room temperature using a dc glow discharge plasma beam deposition method. The glow discharge has been carried out in a mixed gas of nitrogen and methane in different relative proportions and has maintained stable in an glow operating pressure around 30Torr. Scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and Raman spectroscopy were carried out to investigate morphology, composition, structure and crystallinity of the as-deposited films. In scanning electron microscopy images, the as-deposited films consist of crystallites with an average size of about 20–30nm, and an interesting cauliflower structure is found in the center of a prepared sample. The X-ray diffraction results indicate that β- and graphitic-C3N4 crystallites and CNx or carbon nanotubes exist in the as-deposited films. The X-ray photoelectron spectroscopy results show that the [N]/[C] ratios are 0.34–0.46 and the peak shapes and intensities in the N 1s and C 1s regions are similar to those previously reported by our research group using the atom-beam assisted pulsed laser deposition method. The Raman spectra show two separated characteristic bands: a disordered D band (around 1323cm−1) that indicates the presence of C3N4 components, and a graphitic G band (around 1593cm−1). The impacts of the substrate temperatures, nitrogen/methane pressure ratios and Co/Ni layer thicknesses on the properties of the as-deposited films are discussed.

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Mechanical and Tribological Properties of Ion-Beam-enhanced-deposition TiN Thin Films

Formation Of Nanocrystalline Tin Film By Ion-Beam-Enhanced Deposition

Characterization and tribological properties of Cr-N films by ion beam enhanced deposition

Preparation of Cr Hard Coatings by Ion Beam Assisted Electron Beam Vapor Deposition on Ni and Cu Substrates

Synthesis and Modification of Beta-C3n4 Materials by Ion-beam Processing

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Synthesis of nanocrystalline chromium nitride powders by direct nitridation of chromium oxide

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Synthesis of Nanocrystalline Carbon Nitride Films by Glow Discharge Plasma Beam Deposition

Properties and structure of silicon nitride films synthesized by ion-beam-enhanced deposition

Microstructure and mechanical properties of CrN films fabricated by high power pulsed magnetron discharge plasma immersion ion implantation and deposition

Synthesis of Nanocrystalline Chromium Nitride Powders by Direct Nitridation of Chromium Oxide.

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Growth of CrN Films by Plasma Ion Implantation & Deposition Based on High Power Pulsed Magnetron Discharge

Ion-beam-assisted Deposition of CNx Films

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Structural, Electronic, and optical properties of chromium oxynitride thin films grown by RF magnetron sputtering

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