Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and

Facile Scheme for Fabricating Solid-State Nanostructures Using E-Beam Lithography and Solution Precursors

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Electrostatic layer-by-layer nano-assembly: films, cantilevers, micropatterns, and nanocapsules

Solvent-Free Nanofabrication Based on Ice-Assisted Electron-Beam Lithography.

Unconventional Lithography for Patterned Nanomaterials

Reliable fabrication of 3D freestanding nanostructures via all dry stacking of incompatible photoresist

High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

A library of 2D electronic material inks synthesized by liquid-metal-assisted intercalation of crystal powders

All-Water Etching-Free Electron Beam Lithography for On-Chip Nanomaterials

Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching

Electron and X-ray Focused Beam-Induced Cross-Linking in Liquids: Toward Rapid Continuous 3D Nanoprinting and Interfacing using Soft Materials

Laser nano-fabrication inside silicon with spatial beam modulation and non-local seeding

Direct atomic fabrication and dopant positioning in Si using electron beams with active real time image-based feedback

Soft lithography for micro- and nanoscale patterning

Three-dimensional nanofabrication via ultrafast laser patterning and kinetically regulated material assembly

Rapid and low-cost prototyping of 3D nanostructures with multi-layer hydrogen silsesquioxane scaffolds

Fabrication of Nano-Electromechanical Structures Down to 20 nm by Spacer Technology

New Colloidal Lithographic Nanopatterns Fabricated by Combining Pre-Heating and Reactive Ion Etching

Method for Fabricating Micro/Nanostructures Via Scanning Probe Microscope and Anisotropic Wet Etching

Nonlithographic Fabrication of Nanostructured Micropatterns Via Breath Figures and Solution Growth

Fabricating 3D Si nanostructure via a novel Ga+ implantation enabled maskless dry etching process