Abstract:Three-dimensional (3D) free-standing nanostructures have potential applications in many fields with extremely high patterning resolution and design flexibility with direct writing. In numerous Electron Beam Lithography (EBL) processes designed for the creation of three-dimensional structures, the multilayer resist system is pivotal due to its adaptability in design. Nevertheless, the compatibility of solvents between different layers of resists often restricts the variety of feasible multilayer combinations. This paper introduces an innovative approach to address the bottleneck issue by presenting a novel concept of multilayer resist dry stacking, which is facilitated by a near-zero adhesion strategy. The PMMA film is stacked onto the HSQ resist using a dry peel and release technique, effectively circumventing the issue of HSQ solubilization by PMMA solvents typically encountered during conventional spin-coating procedures. Simultaneously, a dry lift-off technique can be implemented by eschewing the use of organic solvents during the wet process. This pioneering method enables the fabrication of high-resolution 3D free-standing plasmonic nanostructures and intricate 3D free-standing nanostructures. Finally, this study presents a compelling proof of concept, showcasing the integration of 3D free-standing nanostructures, fabricated via the described technique, into the realm of Fabry-Perot cavity resonators, thereby highlighting their potential for practical applications. This approach is a promising candidate for arbitrary 3D free-standing nanostructure fabrication, which has potential applications in nanoplasmonics, nanoelectronics, and nanophotonics.

Reliable fabrication of 3D freestanding nanostructures via all dry stacking of incompatible photoresist

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice.

Near-zero-adhesion-enabled Intact Wafer-Scale Resist-Transfer Printing for High-Fidelity Nanofabrication on Arbitrary Substrates

Solvent-Free Nanofabrication Based on Ice-Assisted Electron-Beam Lithography.

Molded Transparent Photopolymers and Phase Shift Optics for Fabricating Three Dimensional Nanostructures.

Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface

A 3D Self-Shaping Strategy for Nanoresolution Multicomponent Architectures

Freestanding Photoresist Film: A Versatile Template for Three‐Dimensional Micro‐ and Nanofabrication

Fabricating 3D Metastructures by Simultaneous Modulation of Flexible Resist Stencils and Basal Molds

Aligned Stacking of Nanopatterned 2D Materials for High-Resolution 3D Device Fabrication

Low-voltage-exposure-enabled Hydrogen Silsesquioxane Bilayer-Like Process for Three-Dimensional Nanofabrication

Rapid and low-cost prototyping of 3D nanostructures with multi-layer hydrogen silsesquioxane scaffolds

Rapid Focused Ion Beam Milling Based Fabrication of Plasmonic Nanoparticles and Assemblies Via "sketch and Peel" Strategy.

Fabricating 3D Si nanostructure via a novel Ga+ implantation enabled maskless dry etching process

Three-dimensional nanofabrication via ultrafast laser patterning and kinetically regulated material assembly

One-Step Mask-Based Diffraction Lithography for the Fabrication of 3D Suspended Structures

3D micro-concrete hybrid structures fabricated by femtosecond laser two-photon polymerization for biomedical and photonic applications

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Residue-free Fabrication of High-Performance Graphene Devices by Patterned PMMA Stencil Mask

Reliable Fabrication of Plasmonic Nanostructures Without an Adhesion Layer Using Dry Lift-Off.