Abstract:Three-dimensional (3D) free-standing nanostructures have potential applications in many fields with extremely high patterning resolution and design flexibility with direct writing. In numerous Electron Beam Lithography (EBL) processes designed for the creation of three-dimensional structures, the multilayer resist system is pivotal due to its adaptability in design. Nevertheless, the compatibility of solvents between different layers of resists often restricts the variety of feasible multilayer combinations. This paper introduces an innovative approach to address the bottleneck issue by presenting a novel concept of multilayer resist dry stacking, which is facilitated by a near-zero adhesion strategy. The PMMA film is stacked onto the HSQ resist using a dry peel and release technique, effectively circumventing the issue of HSQ solubilization by PMMA solvents typically encountered during conventional spin-coating procedures. Simultaneously, a dry lift-off technique can be implemented by eschewing the use of organic solvents during the wet process. This pioneering method enables the fabrication of high-resolution 3D free-standing plasmonic nanostructures and intricate 3D free-standing nanostructures. Finally, this study presents a compelling proof of concept, showcasing the integration of 3D free-standing nanostructures, fabricated via the described technique, into the realm of Fabry-Perot cavity resonators, thereby highlighting their potential for practical applications. This approach is a promising candidate for arbitrary 3D free-standing nanostructure fabrication, which has potential applications in nanoplasmonics, nanoelectronics, and nanophotonics.

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3‐D Nanofabrication of Silicon and Nanostructure Fine‐Tuning via Helium Ion Implantation

Method for Fabricating Micro/Nanostructures Via Scanning Probe Microscope and Anisotropic Wet Etching

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Rapid Prototyping of Organ-on-a-Chip Devices Using Maskless Photolithography

Electrochemical Fabrication of Silicon-Based Micro-Nano-Hybrid Porous Arrays for Hybrid-Lattice Photonic Crystal

Physiochemical Coupled Dynamic Nanosphere Lithography Enabling Multiple Metastructures from Single Mask

Three-dimensional nanofabrication via ultrafast laser patterning and kinetically regulated material assembly

Fabrication of silicon-based multilevel nanostructures via scanning probe oxidation and anisotropic wet etching

Rapid Assembly of Large Scale Transparent Circuit Arrays Using PDMS Nanofilm Shaped Coffee Ring

A New Fabrication Method for 3D Multilayer Microstructure

A 3D Self-Shaping Strategy for Nanoresolution Multicomponent Architectures

Facile Scheme for Fabricating Solid-State Nanostructures Using E-Beam Lithography and Solution Precursors