Structural and Electrical Properties of Co-Evaporated In, Garich Cigs Thin Films

Yu-ming Xue,Bao-he Yang,Chang-qing Qu,Li Zhang,Chuan-ming Xu,Yun Sun
DOI: https://doi.org/10.1007/s11801-008-8067-6
2008-01-01
Abstract:The CIGS thin films are prepared by co-evaporation of elemental In, Ga and Se on the substrates of Mo-coated glasses at 400°C followed by co-evaporation of elemental Cu and Se at 550°C. We study the structural and electrical properties using XRD, XRF and Hall effect measurements. In general, Cu(In,Ga)5Se8 phase exists when Cu/(In+Ga) ratio is from 0.17 to 0.27, Cu(In,Ga)3Se5 phase exists for Cu/(In+Ga) ratio between 0.27 and 0.41, Cu2(In,Ga)4Se7 and Cu(In,Ga)2Se3.5 phases exist for Cu/(In+Ga) ratio between 0.41 and 0.61, and OVC(or ODC) and CuIn0.7Ga0.3Se2 phases exist when Cu/(In+Ga) ratio is from 0.61 to 0.88. With the increase of Cu/(In+Ga) ratio, the carrier concentrations of the films gradually increase, but the electrical resistivity gradually decreases.
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