Assessing excimer far-UVC (222 nm) irradiation for advanced oxidation processes: Oxidants photochemistry and micropollutants degradation
Qing Bai,Qian-Yuan Wu,Bei Ye,Yun-Peng Wu,Ju-Won Lee,Min-Yong Lee,Wen-Long Wang
DOI: https://doi.org/10.1016/j.watres.2024.122505
2024-12-01
Abstract:The KrCl* excimer lamp (UV222) is a promising alternative of low-pressure mercury lamp (UV254) for UV-based advanced oxidation processes (UV-AOPs), because it is mercury-free and has high photon energy. But there lacks a comprehensive assessment of UV222-AOPs based on different radicals. Herein, the properties (e.g., oxidant decay and innate radical quantum yield), and micropollutant degradation, were comprehensively studied for representative oxidants (i.e., hydrogen peroxide, persulfate (PDS), monochloramine, and free active chlorine (FAC)) under UV222 irradiation. UV222 outperformed UV254 for the activation of oxidants with 2.6-14.4 times fluence-based kinetic constant (kF). The main reason of enhanced activation varied with oxidants: higher UV absorbance for H2O2, higher innate quantum yield for monochloramine and FAC, and both reasons for PDS. Overall, PDS was the optimum oxidant under UV222 for the degradation of 8 representative micropollutants because of effective promotion of radical formation, as confirmed by radical competitive kinetics and modeling simulations. In real water, UV222/PDS still show advantages than UV254/PDS in terms of micropollutant elimination efficacy (3.2-5.3 times) and energy consumption (33.9 %-57.6 % lower) though it was more inhibited by water constituents via competing for UV222 photons. This study fills gaps in photochemistry knowledge and will facilitate engineering practice of UV222-AOPs.