AdaOPC 2.0: Enhanced Adaptive Mask Optimization Framework for Via Layers
Wenqian Zhao,Xufeng Yao,Shuo Yin,Yang Bai,Ziyang Yu,Yuzhe Ma,Bei Yu,Martin D.F. Wong
DOI: https://doi.org/10.1109/tcad.2024.3378600
IF: 2.9
2024-01-01
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Abstract:Optical proximity correction (OPC) is a widely used technique to enhance the printability of designs in various foundaries. Recently, there has been a growing interest in using rigorous numerical optimization and machine learning to improve the robustness and efficiency of OPC. Our research focuses on developing a self-adaptive OPC framework that leverages the properties of pattern distribution and repetition in design layouts to optimize the correction process. We observe that different sub-regions in a design layer have varying pattern complexities, and many patterns repeat themselves throughout the layout. By exploiting these properties, we propose a framework that adaptively selects the most suitable OPC solvers from an extensible pool to optimize the correction process for each pattern based on its complexity. This approach allows for a co-optimization of speed and accuracy. Additionally, we introduce a graph-based dynamic pattern library that reuses optimized masks for repeated patterns, further accelerating the OPC flow. Our experimental results demonstrate a significant improvement in both performance and efficiency using our proposed framework.
engineering, electrical & electronic,computer science, interdisciplinary applications, hardware & architecture