Method for optical proximity correction based on a vector imaging model

Ruixuan Wu,Lisong Dong,Yayi Wei

DOI: https://doi.org/10.1364/ao.518578

IF: 1.9

2024-03-28

Applied Optics

Abstract:Ruixuan Wu, Lisong Dong, Yayi Wei Optical proximity correction (OPC) has become an indispensable step in integrated circuit manufacturing. It requires a huge amount of ... [Appl. Opt. 63, 2719-2727 (2024)]

optics

What problem does this paper attempt to address?

Alleviating Image Artifacts in Wavefront Coding Extended Depth of Field Imaging System

Xutao Mo,Tao Zhang,Bin Wang,Xianshan Huang,Cuifang Kuang,Xu Liu

DOI: https://doi.org/10.1016/j.optcom.2018.12.006

IF: 2.4

2018-01-01

Optics Communications

Abstract:Optical imaging systems with extended depth of field based on wavefront coding can be used in many fields, which require more object information along the optical axis in a snapshot. When using the non-rotational symmetric phase masks such as cubic phase mask, the final images are usually restored by classical wiener restoration method. However, the existence of image artifacts in final restored images is a problem to be solved. We proposed a method to alleviate the image artifacts by processing two conjugate images, which are captured by image sensor before and after rotating the phase mask 180 degrees along the optical axis. Unlike the previous methods usually need to measure the point spread function or optical transfer function of the imaging system, we do not need to measure them anymore. Both the ZEMAX simulation and experiment verified our method.
Unified Optical Distortion Correction Method for Imaging Systems Using A Concise Geometrical Transformation Model

Shengqian Chang,Siqi Liu,Fei Yuan,Zhenrong Zheng

DOI: https://doi.org/10.1016/j.optcom.2016.08.069

IF: 2.4

2017-01-01

Optics Communications

Abstract:Since optical distortion has been a big trouble for various kinds of imaging systems, finding a simple correction method with wide applications is of significant importance. In this paper, we propose a unified and simple correction method, performing well for both photographic and projective imaging systems. The basic idea is regarding the optical distortion as geometrical deformation between the object and image, without considering the specific features of an optical system. First of all, a calibration template is employed to establish the geometrical transformation model (GTM) for the distortion of a built optical system. Two alternative algorithms are given to estimate the GTM in algebraic form. The computation is very simple because no intrinsic parameters of the optical system are needed to establish the GTM. Besides, the errors introduced by the fabricating and assembling process can be eliminated. Then, the corrected image of the photographic system or the pre-distorted image of the projective systems can be obtained accordingly utilizing the GTM. Experiments are conducted to demonstrate the effectiveness of our method with wide applications.
Application of Optical Proximity Correction Technology

Cai YiCi,Zhou Qiang,Hong XianLong,Shi Rui,Wang Yang

DOI: https://doi.org/10.1007/s11432-008-0006-4

2008-01-01

Abstract:As process technology scales down to very deep sub-micron (VDSM) in semiconductor manufacturing technology, intrinsic size becomes close to or even shorter than the wavelength used for optical lithography. Thus, some distortions and deformations are introduced by optical proximity effects (OPE) mainly caused by the diffraction and interference of exposure light when layout patterns on a mask are transcribed to a wafer, which influence on the yield and performance of IC circuit. In order to compensate for the deformations, optical proximity correction (OPC) is the most commonly used methodology. Presently, the OPC method is to use a unitary toleration on the whole chip layer, which makes the run time of OPC algorithm longer, causes the size of GDSII files to follow exponential growth, and results in the cost of making mask grow immensely. Firstly, this paper proposes a self-adaptation OPC method with preprocessing function of patterns classification. According to the need of the correction precision, the OPC system divides patterns corrected into two groups with different toleration: critical patterns and general patterns, which enhance the efficiency of the OPC approach. Secondly, a model-based OPC method is presented based on pattern subsection and classification, which keeps the precision of the correction as well as enhances the efficiency. We also propose a rule-based OPC method with general, concise and complete correction rules, and achieve automatic-built rules-based and its looking-up. Thirdly, we also implement an OPC system, called MR-OPC; the MR-OPC system integrates both rule-based OPC and model-based OPC into a whole, so it can solve the confliction between the efficiency and precision. Experimental results show that the MR-OPC system we suggested has advantages of the efficiency and expansibility.
Error Correction Of Laser Scanning System For Reverse Engineering

Hua Ju,Wen Wang,Zichen Chen

2002-01-01

Abstract:The current commercial laser probe is mounted on a computer controlled milling machine and the CAD/CAM integration can be easily achieved for the purpose of reverse engineering. As the laser probe is based on optical triangulation, the sensors are very sensitive to the parameters of the measured object, including color, material, roughness and relative angle between the laser beam and the object. We analyze the above-mentioned factors influencing the accuracy of the laser probes by simulation and experiment relatively. First, model of the systematic errors is developed based on principle of the optical triangulation and the simulation results of the model are given out. Then, experiments are carried out on the measurement error of the laser probe with respect to the color, material, roughness and the surface inclination. Finally, a software correction is applied the experimental calibration to the coordinate value of the measured point. The results show that the simulation model has the same changing trend as the experiment. The calibration to the laser probe by using the error correction method can improve the measurement accuracy for the free-form surfaces.
Research of precision interference locating method for a partial null compensator at aspheric testing

Yongying Yang,Dong Liu,Gao Xin,Chao Tian,Yongjie Luo,Yibing Shen,Yongmo Zhuo

DOI: https://doi.org/10.1117/12.825830

2009-01-01

Abstract:Based on the difference between theoretical with real interferogram images the figure of original aspheric surface can be obtained using an algorithm of Reverse iterate Optimization Reconstruction (ROR) calculating technique. Because the procedure of ray tracing path needed an accurate geometry of optical structure size so the aspheric and compensator L C must be located in the optical path. To avoid the compensator L C resulted in bigger spherical aberration a smart located method is proposed in this paper. Before measurement an aplanatic lens consists of compensator L C and another removable lens L M that the last surface is a standard one. So Fiezau interference is formed by the standard one with reflected ray from the vertex of aspheric that the aspheric surface detected can be accurately located. At testing the lenses L M will be removed and the aspheric is moved to an adapted position. The experiments show the displacement locating accuracy is an amount of micron. The RMS for aspheric testing of ROR calculating technique is better than 1/200 wavelength. © 2009 SPIE.
Optimization Algorithm for Model-Based Optical Proximity Correction

Yici Cai,Yang Wang,Qiang Zhou,Xianlong Hong

DOI: https://doi.org/10.3321/j.issn:0253-4177.2005.03.034

2005-01-01

Abstract:The optimization algorithm considering the surrounding feature influences is presented. The algorithm implements the single-loop optimization for the target feature and the dual-loop optimization between the target features and the surrounding features by using the self-adaptive step cutting and moving strategy. The experiments show that this algorithm can achieve much improvement in correction precision and efficiency.
An Efficient Approach to Rules-Based Optical Proximity Correction

Zhuoyuan Li,Weimin Wu,Yang Wang,Xianlong Hong

DOI: https://doi.org/10.3969/j.issn.1674-4926.2003.12.007

2003-01-01

Abstract:A new approach for rules-based optical proximity correction is presented. The discussion addresses on how to select and construct more concise and practical rules-base as well as how to apply that rules-base. Based on those ideas, several primary rules are suggested. The v-support vector regression method is used to generate a mathematical expression according to rule data. It enables to make correction according to any given rules parameters. Experimental results demonstrate applying rules calculated from the expression match well with that from the rule table.
Optimization of Longitudinal Alignment of an 4<i>f</i> System in a Compact Vectorial Optical-Field Generator Based on a High-Resolution Liquid Crystal Spatial Light Modulator

Mingyu Li,Yuanzheng Liu

DOI: https://doi.org/10.3390/photonics10080894

IF: 2.536

2023-01-01

Photonics

Abstract:Vectorial optical fields have garnered significant attention due to their potential applications in areas such as optical nano-fabrication, optical micromachining, quantum information processing, optical imaging, and so on. Traditional compact vectorial optical generators with amplitude modulation perform poorly in terms of diffraction effect reduction. To tackle this problem, the refractive 4f system in amplitude modulation is longitudinally aligned using an optimization approach presented in this research. The phase images used for longitudinal alignment are loaded into the liquid crystal spatial light modulator (SLM), and the distance between the lens and the mirror in the reflective 4f system is adjusted for longitudinal alignment by compensating for the neglected phase in the integrated module for the compact vectorial optical-field generator. The spot images collected by the CCD are processed using the improved eight-direction Sobel operator and Roberts function, and the longitudinal alignment in the reflective 4f system is determined by the sharpness of the image. The sharpness of the edges of the lines and the overall image are both enhanced after optimization compared to before optimization. The results demonstrate that the proposed method can effectively reduce the longitudinal alignment error of the reflective 4f system in the amplitude modulation of the compact vectorial optical-field generator, lessen the diffraction effect, and improve the performance of the system.
Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer

Yaobin Feng,Jiamin Liu,Zhiyang Song,Hao Jiang,Shiyuan Liu

DOI: https://doi.org/10.1007/s11465-024-0795-1

IF: 4.063

2024-07-20

Frontiers of Mechanical Engineering

Abstract:With the continued shrinking of the critical dimensions (CDs) of wafer patterning, the requirements for modeling precision in optical proximity correction (OPC) increase accordingly. This requirement extends beyond CD controlling accuracy to include pattern alignment accuracy because misalignment can lead to considerable overlay and metal-via coverage issues at advanced nodes, affecting process window and yield. This paper proposes an efficient OPC modeling approach that prioritizes pattern-shift-related elements to tackle the issue accurately. Our method integrates careful measurement selection, the implementation of pattern-shift-aware structures in design, and the manipulation of the cost function during model tuning to establish a robust model. Confirmatory experiments are performed on a via layer fabricated using a negative tone development. Results demonstrate that pattern shifts can be constrained within a range of ±1 nm, remarkably better than the original range of ±3 nm. Furthermore, simulations reveal notable differences between post OPC and original masks when considering pattern shifts at locations sensitive to this phenomenon. Experimental validation confirms the accuracy of the proposed modeling approach, and a firm consistency is observed between the simulation results and experimental data obtained from actual design structures.

engineering, mechanical
A Sparse Matrix Model-Based Optical Proximity Correction Algorithm with Model-Based Mapping Between Segments and Control Sites

Bin Lin,Xiao-lang Yan,Zheng Shi,Yi-wei Yang

DOI: https://doi.org/10.1631/jzus.c1000219

2011-01-01

Journal of Zhejiang University SCIENCE C

Abstract:Optical proximity correction (OPC) is a key step in modern integrated circuit (IC) manufacturing. The quality of model-based OPC (MB-OPC) is directly determined by segment offsets after OPC processing. However, in conventional MB-OPC, the intensity of a control site is adjusted only by the movement of its corresponding segment; this scheme is no longer accurate enough as the lithography process advances. On the other hand, matrix MB-OPC is too time-consuming to become practical. In this paper, we propose a new sparse matrix MB-OPC algorithm with model-based mapping between segments and control sites. We put forward the concept of ‘sensitive area’. When the Jacobian matrix used in the matrix MB-OPC is evaluated, only the elements that correspond to the segments in the sensitive area of every control site need to be calculated, while the others can be set to 0. The new algorithm can effectively improve the sparsity of the Jacobian matrix, and hence reduce the computations. Both theoretical analysis and experiments show that the sparse matrix MB-OPC with model-based mapping is more accurate than conventional MB-OPC, and much faster than matrix MB-OPC while maintaining high accuracy.
Segmentation Optimization Method for Optical Proximity Correction Based on Lithography Model

Xuan SHEN,Zheng SHI

DOI: https://doi.org/10.3969/j.issn.1000-3428.2011.23.072

2011-01-01

Abstract:Currently,a great amount of time is spent on tuning recipe when facing complicated 2D patterns.This paper provides a lithography model segmentation optimization method based on a ripple wave suppression algorithm,which allocates fragments according to extrema on aerial intensity curve and then optimizes algorithm parameters by grid point searching to obtain optimal segmentation scheme.Experimental results show that,this method not only provides stable recipe tuning time,but obtains better Optical Proximity Correction(OPC) fidelity with average reduction of 5% in Edge Placement Error(EPE) comparing with the results from a reference recipe.
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning

Sheng-Wei Chien,Jia-Syun Cai,Chien-Lin Lee,Kuen-Yu Tsai,James Shiely,Matt St. John,James P. Shiely

DOI: https://doi.org/10.1117/12.2515414

2019-03-20

Abstract:Model-based optical proximity correction (MPOPC) has been well adopted in subwavelength lithography for integrated-circuit manufacturing. Typical MBOPC algorithms involve with iteratively moving the layout polygon edges to reduce the edge placement errors (EPEs) predicted by the lithography model. At each iteration, the amounts of movement are mainly determined by the values of the EPEs and the correction factors (CFs). Since full-chip lithography simulation is very computation intensive, it is highly desirable to minimize the number of iterations for acceptable run times, by selecting suitable CFs. In practical applications, the CFs are usually heuristically determined and applied globally throughout the correction regions. This approach efficiently reduces the EPEs at most of the target points but the entire convergence can be hampered at a relatively small number of hot-spot locations. This work investigates the effectiveness of improving the overall convergence by introducing both global and local CFs, and approaches to utilize machine-learning techniques to estimate the hot-spot locations and associated local CF values.
Important Works About Rules in Rules-Based Optical Proximity Correction

Rui Shi,Yici Cai,Xianlong Hong,Weimin Wu,Changqi Yang

DOI: https://doi.org/10.3969/j.issn.1674-4926.2002.07.006

2002-01-01

Abstract:Considering the efficiency and veracity of rules- based optical proximity correction (OPC),the importance of rules in rules-based OPC is pointed out.And how to select,to construct and to apply more concise and practical rules-base is disscussed.Based on those ideas,four primary rules are suggested.Some data resulted in rules-base are shown in table.The patterns on wafer are clearly improved by applying these rules to correct mask.OPCL,the auto matic construction of the rules-base is an important part of the whole rules-b ased OPC system.
Enhanced corner sharpness in DMD-based scanning maskless lithography using optical proximity correction and genetic algorithm

Chao-Li Weng,Chun-Ying Wu,Yung-Chun Lee

DOI: https://doi.org/10.1364/oe.544253

IF: 3.8

2024-11-29

Optics Express

Abstract:Chao-Li Weng, Chun-Ying Wu, Yung-Chun Lee An optical proximity correction (OPC) method is proposed to enhance the UV patterning quality in a DMD-based scanning-type maskless ... [Opt. Express 32, 45357-45372 (2024)]

optics
Design of polygon matching and comparison in IC layout

SHI Zheng,GAO Xiao-ying,REN Jie,SHI Yi-wen

DOI: https://doi.org/10.3969/j.issn.1001-4551.2007.10.011

2007-01-01

Abstract:Optical proximity correction(OPC) is the most important RET and post-OPC fixing technique has become a necessary process to improve the OPC quality.A liner polygon matching and comparison algorithm for post-OPC fixing technique were presented.By comparing the pre-OPC and post-OPC layout,it recognized and recorded the fragmentation and offset information.Therefore the post-OPC fixing process can reuse the previous OPC result.By avoiding redoing OPC all-over again,the entire processing efficiency was highly improved.
Some studies on the interactions and propagating effects in OPC

Zhang Yufu,Shi Zheng,Yan Xiaolang

2006-01-01

Abstract:For emerging deep-subwavelength lithography technologies (65 nm and following) the data volume and the complexity of Optical Proximity Correction (OPC) increase dramatically. This has now become a critical issue in optical lithography and adds to the total cost of IC manufacturing. Hierarchical Processing is one of the most powerful tools for addressing this issue. However, due to the non-negligible propagating corrections and the interactions between neighboring patterns, the conventional OPC can only be executed in a "flattened" way. Some new ideas have been introduced recently to address this issue. However, the interaction problem has never been thoroughly examined and solved. In this paper, we did some fundamental studies to evaluate how the interactions between patterns will influence the result of OPC. Several new ideas like the Segment-Moving Map (SMM) and dynamic correction are brought forward for the first time to help visualize the interactions between neighboring cells after each OPC loop. In our experiment, some representative test patterns are used to show the direction, shape and range of the interacting regions.
A New Method of Implementing Hierarchical OPC

Yufu Zhang,Zheng Shi

DOI: https://doi.org/10.1109/isqed.2007.19

2007-01-01

Abstract:For emerging deep-subwavelength lithography technologies (90 nm and following) the data volume and the complexity of optical proximity correction (OPC) have increased dramatically. This has added to the total cost of IC manufacturing and become an increasingly critical issue in optical lithography. In this paper, we present a new method of implementing hierarchical OPC to explore its merits in runtime saving. The interactions and propagating corrections between neighboring cells during OPC have been discussed and appropriate solutions have been proposed. Segment-moving map (SMM) and dynamic correction are brought forward for the first time to identify the interacting regions in hierarchical OPC and automatically adjust the corrections in these regions. Furthermore, total edge placement error (EPE) is calculated in controlled experiments to test the accuracy of this method. Results have shown that approximately 5times speedup has been achieved with similar accuracy when compared with the conventional OPC method
Edge-based near-field photolithography optical proximity effect correction technique

Jiaxin Ji,Bin Wei,Guangjuan Wen,Zhongwen Lin

DOI: https://doi.org/10.1007/s11082-024-07765-x

IF: 3

2024-11-04

Optical and Quantum Electronics

Abstract:Near-field photolithography can use surface plasmon polaritons to surpass the traditional optical diffraction limit, thus removing the limitation imposed by the light source wavelength on traditional photolithography resolution. However, the optical proximity effect causes uneven patterns produced by near-field photolithography, resulting in significant deviations from the target pattern. This work employs edge-based near-field photolithography optical proximity effect correction technology to optimize mask patterns to resolve the issue of imaging distortion in near-field photolithography. Firstly, a near-field photolithography exposure model is established in Ansys-FDTD software, and based on this model, the optical proximity effect is analyzed using transfer matrix theory and distribution of electric field energy. Secondly, the designed mask pattern is fed into the exposure model to obtain the exposed pattern outline. Therefore, an edge-based compensation rule is proposed to optimize the pattern based on the trend of contour errors. Finally, the mask with the optimized pattern is prepared using near-field imaging photolithography for comparison experiments. According to the experimental results, the optimized mask improves the similarity of photolithography patterns by 34.7% and reduces the average corner error rate by 61.7%. Thus, the optimized imaging mask significantly reduces distortion in photolithography patterns.

engineering, electrical & electronic,optics,quantum science & technology
Model-Based Dynamic Dissection in OPC

Yang Yiwei,Shi Zheng,Yan Xiaolang,Chen Ye

DOI: https://doi.org/10.3321/j.issn:0253-4177.2008.07.040

2008-01-01

Journal of Semiconductors

Abstract:optical proximity correction (OPC) is a key step in nanometer scale lithography technology.Currently,dissection in OPC is recipe-based.However,as the critical features shrink and the layout becomes more complicated,it is hard to debug and handle all possible cases in the layout;Incomplete recipe-based dissection will introduce or worsen the effects of ripple,breaking,bridging,and line-end shortening.This paper presents a new dissection method,which is lithographic model-based and can dynamically change the dissection and sampling point positions during OPC correction loops.According to experiments on 90nm designs,the new dissection method can reduce 10%~15% of segments,save considerable time during recipe debugging,improve OPC quality,and reduce hot spot errors rates by 35%.
Optical Aberration Correction in Postprocessing using Imaging Simulation

Shiqi Chen,Huajun Feng,Dexin Pan,Zhihai Xu,Qi Li,Yueting Chen

DOI: https://doi.org/10.1145/3474088

2023-05-10

Abstract:As the popularity of mobile photography continues to grow, considerable effort is being invested in the reconstruction of degraded images. Due to the spatial variation in optical aberrations, which cannot be avoided during the lens design process, recent commercial cameras have shifted some of these correction tasks from optical design to postprocessing systems. However, without engaging with the optical parameters, these systems only achieve limited correction for <a class="link-external link-http" href="http://aberrations.In" rel="external noopener nofollow">this http URL</a> this work, we propose a practical method for recovering the degradation caused by optical aberrations. Specifically, we establish an imaging simulation system based on our proposed optical point spread function model. Given the optical parameters of the camera, it generates the imaging results of these specific devices. To perform the restoration, we design a spatial-adaptive network model on synthetic data pairs generated by the imaging simulation system, eliminating the overhead of capturing training data by a large amount of shooting and registration. Moreover, we comprehensively evaluate the proposed method in simulations and experimentally with a customized digital-single-lens-reflex (DSLR) camera lens and HUAWEI HONOR 20, respectively. The experiments demonstrate that our solution successfully removes spatially variant blur and color dispersion. When compared with the state-of-the-art deblur methods, the proposed approach achieves better results with a lower computational overhead. Moreover, the reconstruction technique does not introduce artificial texture and is convenient to transfer to current commercial cameras. Project Page: \url{<a class="link-external link-https" href="https://github.com/TanGeeGo/ImagingSimulation" rel="external noopener nofollow">this https URL</a>}.

Computer Vision and Pattern Recognition,Graphics,Multimedia,Image and Video Processing

Method for optical proximity correction based on a vector imaging model

Alleviating Image Artifacts in Wavefront Coding Extended Depth of Field Imaging System

Unified Optical Distortion Correction Method for Imaging Systems Using A Concise Geometrical Transformation Model

Application of Optical Proximity Correction Technology

Error Correction Of Laser Scanning System For Reverse Engineering

Research of precision interference locating method for a partial null compensator at aspheric testing

Optimization Algorithm for Model-Based Optical Proximity Correction

An Efficient Approach to Rules-Based Optical Proximity Correction

Optimization of Longitudinal Alignment of an 4<i>f</i> System in a Compact Vectorial Optical-Field Generator Based on a High-Resolution Liquid Crystal Spatial Light Modulator

Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer

A Sparse Matrix Model-Based Optical Proximity Correction Algorithm with Model-Based Mapping Between Segments and Control Sites

Segmentation Optimization Method for Optical Proximity Correction Based on Lithography Model

Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning

Important Works About Rules in Rules-Based Optical Proximity Correction

Enhanced corner sharpness in DMD-based scanning maskless lithography using optical proximity correction and genetic algorithm

Design of polygon matching and comparison in IC layout

Some studies on the interactions and propagating effects in OPC

A New Method of Implementing Hierarchical OPC

Edge-based near-field photolithography optical proximity effect correction technique

Model-Based Dynamic Dissection in OPC

Optical Aberration Correction in Postprocessing using Imaging Simulation