Abstract:Channel fabrication technology has become increasingly important for microfluidic and nanofluidic devices. In particular, glass channels have high chemical and physical stability, high optical transparency, and ease of surface modification, so that there is increasing interest in glass microfluidic devices for chemical experiments in microfluidics and nanofluidics. For the fabrication of glass channels, especially those with a high aspect ratio (depth/width), lithography using a metal resist and dry etching have mainly been used. However, there are still issues involving the surface roughness of the etched channel and the low etching selectivity. In this study, a microchannel fabrication method with high etching selectivity that produces a smooth etched surface was developed. First, interference during dry etching by remaining Cr particles after the photolithography and Cr etching processes was assumed as the cause of the rough etched surface. Three different dry etching processes were introduced to verify this. In process 1 without removal of the Cr particles, the etched surface was not flat and had a 1 μm scale roughness. In process 2 where a cleaning process was included and high power etching was conducted, a smooth surface with a 1 nm scale roughness and a faster etching rate of 0.3 μm/min were obtained. For this high-power etching condition, the etching selectivity (fused silica/Cr) was relatively low at approximately 39-43. In process 3 with a cleaning process and low-power etching, although the etching rate was relatively low at 0.1 μm/min, a smooth surface with 1 nm scale roughness (10 nm scale roughness deeper than 40 μm in the depth region) and a much higher etching selectivity of approximately 79-84 were obtained. The dry etching method presented in this study represents a significant contribution to microfluidics/nanofluidics for microchannel/nanochannel fabrication.

Laminar flow used as “liquid etch mask” in wet chemical etching to generate glass microstructures with an improved aspect ratio

A Novel Restricted-Flow Etching Method for Glass

Flow-restricted Etching Method on Isotropic Substrates and Its Mechanism

Micro Etching Method Inside Microchannels

Preparation of hybrid soda-lime/quartz glass chips with wettability-patterned channels for manipulation of flow profiles in droplet-based analytical systems.

Flow Behavior Control in Immersion Lithography

The Preparation and Characterization of Uniform Nanoporous Structure on Glass

Micro Fabrication of Micro Fluidic Glass Chip Without Clean Room Condition

Fused silica microchannel fabrication with smooth surface and high etching selectivity

Glass etching to bridge micro- and nanofluidics.

Study On Characteristics Of Interface Between Multiple Laminar Streams And Application For Secondary Etching Inside Microchannels

Bonding of Glass-Based Microfluidic Chips at Low- or Room-Temperature in Routine Laboratory

Fabrication and Analysis of a Fabry-Perot Cavity with a Micromechanical Wet-Etching Process.

High Aspect Ratio Si Etching Technique and Application

Fabrication of high-aspect-ratio fused silica microstructures with large depths using Bessel-beam femtosecond laser-assisted etching

A Rapid and Low-Cost Procedure for Fabrication of Glass Microfluidic Devices

Deep multilevel wet etching of fused silica glass microstructures in BOE solution

Low-temperature plasma etching of high aspect-ratio densely packed 15 to sub-10 nm silicon features derived from PS-PDMS block copolymer patterns

Fabrication of microchannels by space-selective control of phase separation in glass.

High Aspect Ratio Etching of Nanopores in PECVD SiC Through AAO Mask

Uniform Vertical Trench Etching on Silicon with High Aspect Ratio by Metal-Assisted Chemical Etching Using Nanoporous Catalysts.