A Three-Dimensional Microfabrication Technology on Highly Structured Surfaces

Wang-Shen Su,Ming-Shih Tsai,Weileun Fang
DOI: https://doi.org/10.1149/1.2363949
2007-01-01
Abstract:This study presents a simple process to realize the lithography and deposition on a complicated three-dimensional (3D) substrate surface conformally. The 3D lithography and patterning on a highly structured surface is implemented using the self-assembled monolayer (SAM) coating and the plasma treatment. Moreover, the selective film deposition on a 3D surface and even underneath the suspended microstructures is realized using the contact displacement electroless plating. In applications, the Cu film was conformally plated and patterned on a Si substrate with 50-200 mu m deep cavities and 54.7-90 degrees sidewalls. Moreover, the Cu electrode underneath suspended microbeams was also plated. (c) 2006 The Electrochemical Society.
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